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Keywords = hybrid gate dielectric

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9 pages, 3098 KiB  
Article
Terahertz Reconfigurable Planar Graphene Hybrid Yagi–Uda Antenna
by Qimeng Liu, Renbin Zhong, Boli Xu, Jiale Dong, Gefu Teng, Ke Zhong, Zhenhua Wu, Kaichun Zhang, Min Hu and Diwei Liu
Nanomaterials 2025, 15(7), 488; https://doi.org/10.3390/nano15070488 - 25 Mar 2025
Viewed by 494
Abstract
In this paper, we design a frequency reconfigurable antenna for terahertz communication. The antenna is based on a Yagi design, with the main radiating elements being a pair of dipole antennas printed on the top and bottom of a dielectric substrate, respectively. The [...] Read more.
In this paper, we design a frequency reconfigurable antenna for terahertz communication. The antenna is based on a Yagi design, with the main radiating elements being a pair of dipole antennas printed on the top and bottom of a dielectric substrate, respectively. The director and reflector elements give the antenna end-fire characteristics. The ends of the two arms of the dipole are constructed by staggered metal and graphene parasitic patches. By utilizing the effect of gate voltage on the conductivity of graphene, the equivalent length of the dipole antenna arms are altered and thereby adjust the antenna’s operating frequency. The proposed reconfigurable hybrid Yagi–Uda antenna can operate in five frequency bands separately at a peak gain of 4.53 dB. This reconfigurable antenna can meet the diverse requirements of the system without changing its structure and can reduce the size and cost while improving the performance. Full article
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36 pages, 6996 KiB  
Review
Organic–Inorganic Hybrid Dielectric Layers for Low-Temperature Thin-Film Transistors Applications: Recent Developments and Perspectives
by Javier Meza-Arroyo and Rafael Ramírez-Bon
Technologies 2025, 13(1), 20; https://doi.org/10.3390/technologies13010020 - 2 Jan 2025
Viewed by 3031
Abstract
This paper reviews the recent development of organic–inorganic hybrid dielectric materials for application as gate dielectrics in thin-film transistors (TFTs). These hybrid materials consist of the blending of high-k inorganic dielectrics with polymers, and their resulting properties depend on the amount and type [...] Read more.
This paper reviews the recent development of organic–inorganic hybrid dielectric materials for application as gate dielectrics in thin-film transistors (TFTs). These hybrid materials consist of the blending of high-k inorganic dielectrics with polymers, and their resulting properties depend on the amount and type of interactions between the organic and inorganic phases. The resulting amorphous networks, characterized by crosslinked organic and inorganic phases, can be tailored for specific applications, including gate dielectrics in TFTs. As dielectric materials, they offer a synergistic combination of high dielectric constants, low leakage currents, and mechanical flexibility, crucial for next-generation flexible electronics. Furthermore, organic–inorganic hybrid materials are easily processed in solution, allowing for low-temperature deposition compatible with flexible substrates. Various configurations of these hybrid gate dielectrics, such as bilayer structures and polymer nanocomposites, are discussed, with an emphasis on their potential to enhance device performance. Despite the significant advancements, challenges remain in optimizing the performance and stability of these hybrid materials. This review summarizes recent progress and highlights the advantages and emerging applications of low-temperature, solution-processed hybrid dielectrics, with a focus on their integration into flexible, stretchable, and wearable electronic devices. Full article
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23 pages, 7835 KiB  
Review
Hydrogel-Gated FETs in Neuromorphic Computing to Mimic Biological Signal: A Review
by Sankar Prasad Bag, Suyoung Lee, Jaeyoon Song and Jinsink Kim
Biosensors 2024, 14(3), 150; https://doi.org/10.3390/bios14030150 - 19 Mar 2024
Cited by 4 | Viewed by 3514
Abstract
Hydrogel-gated synaptic transistors offer unique advantages, including biocompatibility, tunable electrical properties, being biodegradable, and having an ability to mimic biological synaptic plasticity. For processing massive data with ultralow power consumption due to high parallelism and human brain-like processing abilities, synaptic transistors have been [...] Read more.
Hydrogel-gated synaptic transistors offer unique advantages, including biocompatibility, tunable electrical properties, being biodegradable, and having an ability to mimic biological synaptic plasticity. For processing massive data with ultralow power consumption due to high parallelism and human brain-like processing abilities, synaptic transistors have been widely considered for replacing von Neumann architecture-based traditional computers due to the parting of memory and control units. The crucial components mimic the complex biological signal, synaptic, and sensing systems. Hydrogel, as a gate dielectric, is the key factor for ionotropic devices owing to the excellent stability, ultra-high linearity, and extremely low operating voltage of the biodegradable and biocompatible polymers. Moreover, hydrogel exhibits ionotronic functions through a hybrid circuit of mobile ions and mobile electrons that can easily interface between machines and humans. To determine the high-efficiency neuromorphic chips, the development of synaptic devices based on organic field effect transistors (OFETs) with ultra-low power dissipation and very large-scale integration, including bio-friendly devices, is needed. This review highlights the latest advancements in neuromorphic computing by exploring synaptic transistor developments. Here, we focus on hydrogel-based ionic-gated three-terminal (3T) synaptic devices, their essential components, and their working principle, and summarize the essential neurodegenerative applications published recently. In addition, because hydrogel-gated FETs are the crucial members of neuromorphic devices in terms of cutting-edge synaptic progress and performances, the review will also summarize the biodegradable and biocompatible polymers with which such devices can be implemented. It is expected that neuromorphic devices might provide potential solutions for the future generation of interactive sensation, memory, and computation to facilitate the development of multimodal, large-scale, ultralow-power intelligent systems. Full article
(This article belongs to the Section Biosensor and Bioelectronic Devices)
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16 pages, 4632 KiB  
Article
Preparation of Low-Temperature Solution-Processed High-κ Gate Dielectrics Using Organic–Inorganic TiO2 Hybrid Nanoparticles
by Hong Nhung Le, Rixuan Wang, Benliang Hou, Sehyun Kim and Juyoung Kim
Nanomaterials 2024, 14(6), 488; https://doi.org/10.3390/nano14060488 - 8 Mar 2024
Cited by 2 | Viewed by 2139
Abstract
Organic–inorganic hybrid dielectric nanomaterials are vital for OTFT applications due to their unique combination of organic dielectric and inorganic properties. Despite the challenges in preparing stable titania (TiO2) nanoparticles, we successfully synthesized colloidally stable organic–inorganic (O-I) TiO2 hybrid nanoparticles using [...] Read more.
Organic–inorganic hybrid dielectric nanomaterials are vital for OTFT applications due to their unique combination of organic dielectric and inorganic properties. Despite the challenges in preparing stable titania (TiO2) nanoparticles, we successfully synthesized colloidally stable organic–inorganic (O-I) TiO2 hybrid nanoparticles using an amphiphilic polymer as a stabilizer through a low-temperature sol–gel process. The resulting O-I TiO2 hybrid sols exhibited long-term stability and formed a high-quality dielectric layer with a high dielectric constant (κ) and minimal leakage current density. We also addressed the effect of the ethylene oxide chain within the hydrophilic segment of the amphiphilic polymer on the dielectric properties of the coating film derived from O-I TiO2 hybrid sols. Using the O-I TiO2 hybrid dielectric layer with excellent insulating properties enhanced the electrical performance of the gate dielectrics, including superior field-effect mobility and stable operation in OTFT devices. We believe that this study provides a reliable method for the preparation of O-I hybrid TiO2 dielectric materials designed to enhance the operational stability and electrical performance of OTFTs. Full article
(This article belongs to the Special Issue Advanced Nanomaterials for Flexible and Wearable Electronics)
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14 pages, 4901 KiB  
Article
Ultrathin Encapsulation Strategies with Predefined Gate Dielectric Surface Area for Flexible Crystalline Silicon Nanomembrane-Based MOS Capacitors
by Zhuofan Wang, Hongliang Lu, Yuming Zhang and Chen Liu
Crystals 2024, 14(2), 190; https://doi.org/10.3390/cryst14020190 - 14 Feb 2024
Viewed by 1612
Abstract
Ultrathin encapsulation strategies show huge potential in wearable and implantable electronics. However, insightful efforts are still needed to improve the electrical and mechanical characteristics of encapsulated devices. This work introduces Al2O3/alucone nanolaminates using hybrid atomic/molecular layer deposition for ultrathin [...] Read more.
Ultrathin encapsulation strategies show huge potential in wearable and implantable electronics. However, insightful efforts are still needed to improve the electrical and mechanical characteristics of encapsulated devices. This work introduces Al2O3/alucone nanolaminates using hybrid atomic/molecular layer deposition for ultrathin encapsulation structures employed in crystalline silicon nanomembrane (Si NM)-based metal-oxide-semiconductor capacitors (MOSCAPs). The comprehensive electrical and mechanical analysis focused on the encapsulated and bare MOSCAPs with three gate dielectric diameters (Ø) under planar and bending conditions, including concave bending radii of 110.5 mm and 85 mm as well as convex bending radii of 77.5 mm and 38.5 mm. Combined with the Ø-related mechanical analysis of the maximum strain in the critical layers and the practical investigations of electrical parameters, the encapsulated MOSCAPs with Ø 160 μm showed the most stable electro-mechanical performance partly due to the optimized position of the neutral mechanical plane. Comparison of the electrical changes in Al2O3/alucone-encapsulated MOSCAPs with Ø 160 μm, Ø 240 μm, and Ø 320 μm showed that it is beneficial to define the gate dielectric surface area of 0.02 to 0.05 mm2 for Si NM-based wearable electronics. These findings are significant for leveraging the practical applications in ultrathin encapsulation strategies for reliable operations of crystalline Si NM-based integrated circuits. Full article
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10 pages, 2884 KiB  
Article
Time-Dependent Sensitivity Tunable pH Sensors Based on the Organic-Inorganic Hybrid Electric-Double-Layer Transistor
by Ki-Woong Park and Won-Ju Cho
Int. J. Mol. Sci. 2022, 23(18), 10842; https://doi.org/10.3390/ijms231810842 - 16 Sep 2022
Cited by 4 | Viewed by 2181
Abstract
In this study, we propose tunable pH sensors based on the electric-double-layer transistor (EDLT) with time-dependent sensitivity characteristics. The EDLT is able to modulate the drain current by using the mobile ions inside the electrolytic gate dielectric. This property allows the implementation of [...] Read more.
In this study, we propose tunable pH sensors based on the electric-double-layer transistor (EDLT) with time-dependent sensitivity characteristics. The EDLT is able to modulate the drain current by using the mobile ions inside the electrolytic gate dielectric. This property allows the implementation of a device with sensitivity characteristics that are simply adjusted according to the measurement time. An extended gate-type, ion-sensitive, field-effect transistor consisting of a chitosan/Ta2O5 hybrid dielectric EDLT transducer, and an SnO2 sensing membrane, were fabricated to evaluate the sensing behavior at different buffer pH levels. As a result, we were able to achieve tunable sensitivity by only adjusting the measurement time by using a single EDLT and without additional gate electrodes. In addition, to demonstrate the unique sensing behavior of the time-dependent tunable pH sensors based on organic–inorganic hybrid EDLT, comparative sensors consisting of a normal FET with a SiO2 gate dielectric were prepared. It was found that the proposed pH sensors exhibit repeatable and stable sensing operations with drain current deviations <1%. Therefore, pH sensors using a chitosan electrolytic EDLT are suitable for biosensor platforms, possessing tunable sensitivity and high-reliability characteristics. Full article
(This article belongs to the Special Issue Recent Advances in Nanomaterials Science)
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26 pages, 3087 KiB  
Review
Status of Aluminum Oxide Gate Dielectric Technology for Insulated-Gate GaN-Based Devices
by Anthony Calzolaro, Thomas Mikolajick and Andre Wachowiak
Materials 2022, 15(3), 791; https://doi.org/10.3390/ma15030791 - 21 Jan 2022
Cited by 27 | Viewed by 7312
Abstract
Insulated-gate GaN-based transistors can fulfill the emerging demands for the future generation of highly efficient electronics for high-frequency, high-power and high-temperature applications. However, in contrast to Si-based devices, the introduction of an insulator on (Al)GaN is complicated by the absence of a high-quality [...] Read more.
Insulated-gate GaN-based transistors can fulfill the emerging demands for the future generation of highly efficient electronics for high-frequency, high-power and high-temperature applications. However, in contrast to Si-based devices, the introduction of an insulator on (Al)GaN is complicated by the absence of a high-quality native oxide for GaN. Trap states located at the insulator/(Al)GaN interface and within the dielectric can strongly affect the device performance. In particular, although AlGaN/GaN metal–insulator–semiconductor high electron mobility transistors (MIS-HEMTs) provide superior properties in terms of gate leakage currents compared to Schottky-gate HEMTs, the presence of an additional dielectric can induce threshold voltage instabilities. Similarly, the presence of trap states can be detrimental for the operational stability and reliability of other architectures of GaN devices employing a dielectric layer, such as hybrid MIS-FETs, trench MIS-FETs and vertical FinFETs. In this regard, the minimization of trap states is of critical importance to the advent of different insulated-gate GaN-based devices. Among the various dielectrics, aluminum oxide (Al2O3) is very attractive as a gate dielectric due to its large bandgap and band offsets to (Al)GaN, relatively high dielectric constant, high breakdown electric field as well as thermal and chemical stability against (Al)GaN. Additionally, although significant amounts of trap states are still present in the bulk Al2O3 and at the Al2O3/(Al)GaN interface, the current technological progress in the atomic layer deposition (ALD) process has already enabled the deposition of promising high-quality, uniform and conformal Al2O3 films to gate structures in GaN transistors. In this context, this paper first reviews the current status of gate dielectric technology using Al2O3 for GaN-based devices, focusing on the recent progress in engineering high-quality ALD-Al2O3/(Al)GaN interfaces and on the performance of Al2O3-gated GaN-based MIS-HEMTs for power switching applications. Afterwards, novel emerging concepts using the Al2O3-based gate dielectric technology are introduced. Finally, the recent status of nitride-based materials emerging as other gate dielectrics is briefly reviewed. Full article
(This article belongs to the Special Issue Feature Papers in Electronic Materials Section)
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15 pages, 2423 KiB  
Article
Preparation and Application of Organic-Inorganic Nanocomposite Materials in Stretched Organic Thin Film Transistors
by Yang-Yen Yu and Cheng-Huai Yang
Polymers 2020, 12(5), 1058; https://doi.org/10.3390/polym12051058 - 5 May 2020
Cited by 10 | Viewed by 3628
Abstract
High-transparency soluble polyimide with COOH and fluorine functional groups and TiO2-SiO2 composite inorganic nanoparticles with high dielectric constants were synthesized in this study. The polyimide and inorganic composite nanoparticles were further applied in the preparation of organic-inorganic hybrid high dielectric [...] Read more.
High-transparency soluble polyimide with COOH and fluorine functional groups and TiO2-SiO2 composite inorganic nanoparticles with high dielectric constants were synthesized in this study. The polyimide and inorganic composite nanoparticles were further applied in the preparation of organic-inorganic hybrid high dielectric materials as the gate dielectric for a stretchable transistor. The optimal ratio of organic and inorganic components in the hybrid films was investigated. In addition, Jeffamine D2000 and polyurethane were added to the gate dielectric to improve the tensile properties of the organic thin film transistor (OTFT) device. PffBT4T-2OD was used as the semiconductor layer material and indium gallium liquid alloy as the upper electrode. Electrical property analysis demonstrated that the mobility could reach 0.242 cm2·V−1·s−1 at an inorganic content of 30 wt.%, and the switching current ratio was 9.04 × 103. After Jeffamine D2000 and polyurethane additives were added, the mobility and switching current could be increased to 0.817 cm2·V−1·s−1 and 4.27 × 105 for Jeffamine D2000 and 0.562 cm2·V−1·s−1 and 2.04 × 105 for polyurethane, respectively. Additives also improved the respective mechanical properties. The stretching test indicated that the addition of polyurethane allowed the OTFT device to be stretched to 50%, and the electrical properties could be maintained after stretching 150 cycles. Full article
(This article belongs to the Special Issue Advanced Polymer Nanocomposites)
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10 pages, 2077 KiB  
Article
Facile Synthesis of Solution-Processed Silica and Polyvinyl Phenol Hybrid Dielectric for Flexible Organic Transistors
by Xiong Chen, Yu Zhang, Xiangfeng Guan and Hao Zhang
Nanomaterials 2020, 10(4), 806; https://doi.org/10.3390/nano10040806 - 23 Apr 2020
Cited by 3 | Viewed by 2746
Abstract
A high-quality dielectric layer is essential for organic thin-film transistors (OTFTs) operated at a low-power consumption level. In this study, a facile improved technique for the synthesis of solution-processed silica is proposed. By optimizing the synthesis and processing technique fewer pores were found [...] Read more.
A high-quality dielectric layer is essential for organic thin-film transistors (OTFTs) operated at a low-power consumption level. In this study, a facile improved technique for the synthesis of solution-processed silica is proposed. By optimizing the synthesis and processing technique fewer pores were found on the surface of the film, particularly no large holes were observable after improving the annealing process, and the improved solution–gelation (sol–gel) SiOx dielectric achieved a higher breakdown strength (1.6 MV/cm) and lower leakage current density (10−8 A/cm2 at 1.5 MV/cm). Consequently, a pentacene based OTFT with a high field effect mobility (~1.8 cm2/Vs), a low threshold voltage (−1.7 V), a steeper subthreshold slope (~0.4 V/dec) and a relatively high on/off ratio (~105) was fabricated by applying a hybrid gate insulator which consisted of improved sol–gel SiOx and polyvinyl phenol (PVP). This could be ascribed to both the high k of SiOx and the smoother, hydrophobic dielectric surface with low trap density, which was proved by atomic force microscopy (AFM) and a water contact angle test, respectively. Additionally, we systematically studied and evaluated the stability of devices in the compressed state. The devices based on dielectric fabricated by conventional sol–gel processes were more susceptible to the curvature. While the improved device presented an excellent mechanic strength, it could still function at the higher bending compression without a significant degradation in performance. Thus, this solution-process technology provides an effective approach to fabricate high-quality dielectric and offers great potential for low-cost, fast and portable organic electronic applications. Full article
(This article belongs to the Section Synthesis, Interfaces and Nanostructures)
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11 pages, 2729 KiB  
Article
Textile Display with AMOLED Using a Stacked-Pixel Structure on a Polyethylene Terephthalate Fabric Substrate
by Jae Seon Kim and Chung Kun Song
Materials 2019, 12(12), 2000; https://doi.org/10.3390/ma12122000 - 22 Jun 2019
Cited by 16 | Viewed by 7658
Abstract
An active-mode organic light-emitting diode (AMOLED) display on a fabric substrate is expected to be a prominent textile display for e-textile applications. However, the large surface roughness of the fabric substrate limits the aperture ratio—the area ratio of the organic light-emitting diode (OLED) [...] Read more.
An active-mode organic light-emitting diode (AMOLED) display on a fabric substrate is expected to be a prominent textile display for e-textile applications. However, the large surface roughness of the fabric substrate limits the aperture ratio—the area ratio of the organic light-emitting diode (OLED) to the total pixel area. In this study, the aperture ratio of the AMOLED panel fabricated on the polyethylene terephthalate fabric substrate was enhanced by applying a stacked-pixel structure, in which the OLED was deposited above the organic thin-film transistor (OTFT) pixel circuit layer. The stacked pixels were achieved using the following three key technologies. First, the planarization process of the fabric substrate was performed by sequentially depositing a polyurethane and photo-acryl layer, improving the surface roughness from 10 μm to 0.3 μm. Second, a protection layer consisting of three polymer layers, a water-soluble poly-vinyl alcohol, dichromated-polyvinylalcohol (PVA), and photo acryl, formed by a spin-coating processes was inserted between the OTFT circuit and the OLED layer. Third, a high mobility of 0.98 cm2/V∙s was achieved at the panel scale by using hybrid carbon nano-tube (CNT)/Au (5 nm) electrodes for the S/D contacts and the photo-acryl (PA) for the gate dielectric, enabling the supply of a sufficiently large current (40 μA @ VGS = −10 V) to the OLED. The aperture ratio of the AMOLED panel using the stacked-pixel structure was improved to 48%, which was about two times larger than the 19% of the side-by-side pixel, placing the OLED just beside the OTFTs on the same plane. Full article
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24 pages, 7413 KiB  
Article
On Developing Field-Effect-Tunable Nanofluidic Ion Diodes with Bipolar, Induced-Charge Electrokinetics
by Ye Tao, Weiyu Liu, Yukun Ren, Yansu Hu, Guang Li, Guoyun Ma and Qisheng Wu
Micromachines 2018, 9(4), 179; https://doi.org/10.3390/mi9040179 - 12 Apr 2018
Cited by 10 | Viewed by 5101
Abstract
We introduce herein the induced-charge electrokinetic phenomenon to nanometer fluidic systems; the design of the nanofluidic ion diode for field-effect ionic current control of the nanometer dimension is developed by enhancing internal ion concentration polarization through electrochemical transport of inhomogeneous inducing-counterions resulting from [...] Read more.
We introduce herein the induced-charge electrokinetic phenomenon to nanometer fluidic systems; the design of the nanofluidic ion diode for field-effect ionic current control of the nanometer dimension is developed by enhancing internal ion concentration polarization through electrochemical transport of inhomogeneous inducing-counterions resulting from double gate terminals mounted on top of a thin dielectric layer, which covers the nanochannel connected to microfluidic reservoirs on both sides. A mathematical model based on the fully-coupled Poisson-Nernst-Plank-Navier-Stokes equations is developed to study the feasibility of this structural configuration causing effective ionic current rectification. The effect of various physiochemical and geometrical parameters, such as the native surface charge density on the nanochannel sidewalls, the number of gate electrodes (GE), the gate voltage magnitude, and the solution conductivity, permittivity, and thickness of the dielectric coating, as well as the size and position of the GE pair of opposite gate polarity, on the resulted rectification performance of the presented nanoscale ionic device is numerically analyzed by using a commercial software package, COMSOL Multiphysics (version 5.2). Three types of electrohydrodynamic flow, including electroosmosis of 1st kind, induced-charge electroosmosis, and electroosmosis of 2nd kind that were originated by the Coulomb force within three distinct charge layers coexist in the micro/nanofluidic hybrid network and are shown to simultaneously influence the output current flux in a complex manner. The rectification factor of a contrast between the ‘on’ and ‘off’ working states can even exceed one thousand-fold in the case of choosing a suitable combination of several key parameters. Our demonstration of field-effect-tunable nanofluidic ion diodes of double external gate electrodes proves invaluable for the construction of a flexible electrokinetic platform for ionic current control and may help transform the field of smart, on-chip, integrated circuits. Full article
(This article belongs to the Special Issue Micro/Nano-Chip Electrokinetics, Volume II)
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10 pages, 2531 KiB  
Communication
Frequency-Stable Ionic-Type Hybrid Gate Dielectrics for High Mobility Solution-Processed Metal-Oxide Thin-Film Transistors
by Jae Sang Heo, Seungbeom Choi, Jeong-Wan Jo, Jingu Kang, Ho-Hyun Park, Yong-Hoon Kim and Sung Kyu Park
Materials 2017, 10(6), 612; https://doi.org/10.3390/ma10060612 - 3 Jun 2017
Cited by 9 | Viewed by 5866
Abstract
In this paper, we demonstrate high mobility solution-processed metal-oxide thin-film transistors (TFTs) by using a high-frequency-stable ionic-type hybrid gate dielectric (HGD). The HGD gate dielectric, a blend of sol-gel aluminum oxide (AlOx) and poly(4-vinylphenol) (PVP), exhibited high dielectric constant (ε~8.15) and [...] Read more.
In this paper, we demonstrate high mobility solution-processed metal-oxide thin-film transistors (TFTs) by using a high-frequency-stable ionic-type hybrid gate dielectric (HGD). The HGD gate dielectric, a blend of sol-gel aluminum oxide (AlOx) and poly(4-vinylphenol) (PVP), exhibited high dielectric constant (ε~8.15) and high-frequency-stable characteristics (1 MHz). Using the ionic-type HGD as a gate dielectric layer, an minimal electron-double-layer (EDL) can be formed at the gate dielectric/InOx interface, enhancing the field-effect mobility of the TFTs. Particularly, using the ionic-type HGD gate dielectrics annealed at 350 °C, InOx TFTs having an average field-effect mobility of 16.1 cm2/Vs were achieved (maximum mobility of 24 cm2/Vs). Furthermore, the ionic-type HGD gate dielectrics can be processed at a low temperature of 150 °C, which may enable their applications in low-thermal-budget plastic and elastomeric substrates. In addition, we systematically studied the operational stability of the InOx TFTs using the HGD gate dielectric, and it was observed that the HGD gate dielectric effectively suppressed the negative threshold voltage shift during the negative-illumination-bias stress possibly owing to the recombination of hole carriers injected in the gate dielectric with the negatively charged ionic species in the HGD gate dielectric. Full article
(This article belongs to the Special Issue Oxide Semiconductor Thin-Film Transistor)
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18 pages, 12621 KiB  
Review
Role of the Potential Barrier in the Electrical Performance of the Graphene/SiC Interface
by Ivan Shtepliuk, Tihomir Iakimov, Volodymyr Khranovskyy, Jens Eriksson, Filippo Giannazzo and Rositsa Yakimova
Crystals 2017, 7(6), 162; https://doi.org/10.3390/cryst7060162 - 2 Jun 2017
Cited by 29 | Viewed by 9119
Abstract
In spite of the great expectations for epitaxial graphene (EG) on silicon carbide (SiC) to be used as a next-generation high-performance component in high-power nano- and micro-electronics, there are still many technological challenges and fundamental problems that hinder the full potential of EG/SiC [...] Read more.
In spite of the great expectations for epitaxial graphene (EG) on silicon carbide (SiC) to be used as a next-generation high-performance component in high-power nano- and micro-electronics, there are still many technological challenges and fundamental problems that hinder the full potential of EG/SiC structures and that must be overcome. Among the existing problems, the quality of the graphene/SiC interface is one of the most critical factors that determines the electroactive behavior of this heterostructure. This paper reviews the relevant studies on the carrier transport through the graphene/SiC, discusses qualitatively the possibility of controllable tuning the potential barrier height at the heterointerface and analyses how the buffer layer formation affects the electronic properties of the combined EG/SiC system. The correlation between the sp2/sp3 hybridization ratio at the interface and the barrier height is discussed. We expect that the barrier height modulation will allow realizing a monolithic electronic platform comprising different graphene interfaces including ohmic contact, Schottky contact, gate dielectric, the electrically-active counterpart in p-n junctions and quantum wells. Full article
(This article belongs to the Special Issue Integration of 2D Materials for Electronics Applications)
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