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Editorial

Acknowledgment to Reviewers of Clean Technologies in 2020

by
Clean Technologies Editorial Office
MDPI AG, St. Alban-Anlage 66, 4052 Basel, Switzerland
Clean Technol. 2021, 3(1), 79-80; https://doi.org/10.3390/cleantechnol3010005
Published: 26 January 2021
Peer review is the driving force of journal development, and reviewers are gatekeepers who ensure that Clean Technologies maintains its standards for the high quality of its published papers. Thanks to the cooperation of our reviewers, in 2020, the median time to first decision was 17.5 days and the median time to publication was 53 days. The editors would like to express their sincere gratitude to the following reviewers for their precious time and dedication, regardless of whether the papers were finally published:
Afenyo, MawuliManzano-Agugliaro, Francisco
Alcaso, Adérito NetoMarchev, Andrey
Amanowicz, ŁukaszMariana, Iorgulescu
An, FeifeiMartínez-Márquez, Camilo I.
Andrianasolo, EricMartino, Marco
Aspegren, HenrikMasłoń, Adam
Astolfi, DavideMatsuyama, Hideto
Attia, ShadyMayyahi, Ahmed Al
Bagalkot, NikhilMedyńska-Juraszek, Agnieszka
Barwicki, JanMeng, Zheng
Baur, StuartMiccio, Francesco
Bennamoun, LyesMikołajczyk, Tomasz
Bernal-Perez, SoledadMinciuc, Eduard
Beszédes, SándorMohelnikova, Jitka
Brito, PauloMoliner, Cristina
Brunklaus, GuntherMuro, Aldo
Cablé, AxelMutlu, Mete
Cecconet, DanieleNag, Soumyadeep
Ceran, BartoszNaser, M. Z.
Cespi, DanieleNawarathna, Thiloththama Hiranya Kumari
Chan, Fan LiangNetskina, Olga
Charvátová, HanaNikolovski, Srete
Chen, DaiqinNizetic, Sandro
Chioncel, Cristian PaulOgliari, Emanuele
Cho, In SunOryani, Bahareh
Cinelli, PatriziaOstadhassan, Mehdi
Craciunescu, AurelianPană, Adrian
Cuerdo Vilches, María TeresaPanepinto, Deborah
D’Adamo, IdianoPaul, Suvash Chandra
Di Fazio, Anna RitaPawlak, Andrzej
Dipu, Arnoldus LambertusPerea-Moreno, Miguel-Angel
Dzida, MarzenaPereira, Leonel
El-Sayed, MarwaPérez-Collazo, Carlos
Eszter, Hubainé TóthPham, Hong Duc
Ferrantelli, AndreaPorowski, Adam
Flores, Robert J.Proszak-Miąsik, Danuta
García-gracia, MiguelPutta, Koteswara Rao
Gil-Garcia, Isabel CristinaRaston, Colin L
Girolami, FlaviaRedel-Macías, María Dolores
Goit, Jay PrakashRemón, Javier
Gómez-Soberón, Jose ManuelRodgers, Marianne
Gullo, ParideSagnelli, Domenico
Hammad, AhmedSalerno, Carlo
Heift, DominikusSassanelli, Claudio
Helmi, ArashSchirp, Arne
Honrubia-Escribano, AndresSchmidt, Jonas
Howell, BobShandro, Janis
Hu, GuopingShao, Jiankun
Hybská, HelenaSimões, Nádia
Ichinose, ToshiakiȘoimoșan, Teodora Melania
Ihara, TakeshiSousa, Cristina
Ionescu, Laurentiu MihaiSSennoga, Twaha
Irshad, AhamedStaszewski, Łukasz
Isaev, AbdulgalimStechel, Ellen
Jindrichovska, IrenaStegenta-Dąbrowska, Sylwia
Kang, SeongminTeixeira, Carlos
Kapica, JacekTheristis, Marios
Kara De Maeijer, PatriciaTomczewski, Andrzej
Karvelas, EvangelosȚoniș Bucea-Manea, Rocsana
Kasperski, AndrzejTopor, Marcel
Katioglu-Yazan, TugceUrbanik, Marek
Khalili, Nasrin R.Vakalis, Stergios
Kim, Man-HoeVan Duijsen, Peter
Kishore, Ravi AnantVaverková, Magdalena Daria
Kotter, RichardViguri, Javier R.
Kučera, MariánVojtisek-Lom, Michal
Kura, BranislavVollprecht, Daniel
Lau, AnthonyVuppala, Srikanth
Liao, Chien-SenWeng, Guo-Ming
Liu, QiliWolny, Lidia
Loganathan, Bommanna G.Yoshida, Shigeo
Luck, RudyYu, Xi
Lykidis, CharalamposZhou, Xiaochi (Joe)
Manta, Otilia
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MDPI and ACS Style

Clean Technologies Editorial Office. Acknowledgment to Reviewers of Clean Technologies in 2020. Clean Technol. 2021, 3, 79-80. https://doi.org/10.3390/cleantechnol3010005

AMA Style

Clean Technologies Editorial Office. Acknowledgment to Reviewers of Clean Technologies in 2020. Clean Technologies. 2021; 3(1):79-80. https://doi.org/10.3390/cleantechnol3010005

Chicago/Turabian Style

Clean Technologies Editorial Office. 2021. "Acknowledgment to Reviewers of Clean Technologies in 2020" Clean Technologies 3, no. 1: 79-80. https://doi.org/10.3390/cleantechnol3010005

APA Style

Clean Technologies Editorial Office. (2021). Acknowledgment to Reviewers of Clean Technologies in 2020. Clean Technologies, 3(1), 79-80. https://doi.org/10.3390/cleantechnol3010005

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