Acknowledgment to Reviewers of Clean Technologies in 2020
Afenyo, Mawuli | Manzano-Agugliaro, Francisco |
Alcaso, Adérito Neto | Marchev, Andrey |
Amanowicz, Łukasz | Mariana, Iorgulescu |
An, Feifei | Martínez-Márquez, Camilo I. |
Andrianasolo, Eric | Martino, Marco |
Aspegren, Henrik | Masłoń, Adam |
Astolfi, Davide | Matsuyama, Hideto |
Attia, Shady | Mayyahi, Ahmed Al |
Bagalkot, Nikhil | Medyńska-Juraszek, Agnieszka |
Barwicki, Jan | Meng, Zheng |
Baur, Stuart | Miccio, Francesco |
Bennamoun, Lyes | Mikołajczyk, Tomasz |
Bernal-Perez, Soledad | Minciuc, Eduard |
Beszédes, Sándor | Mohelnikova, Jitka |
Brito, Paulo | Moliner, Cristina |
Brunklaus, Gunther | Muro, Aldo |
Cablé, Axel | Mutlu, Mete |
Cecconet, Daniele | Nag, Soumyadeep |
Ceran, Bartosz | Naser, M. Z. |
Cespi, Daniele | Nawarathna, Thiloththama Hiranya Kumari |
Chan, Fan Liang | Netskina, Olga |
Charvátová, Hana | Nikolovski, Srete |
Chen, Daiqin | Nizetic, Sandro |
Chioncel, Cristian Paul | Ogliari, Emanuele |
Cho, In Sun | Oryani, Bahareh |
Cinelli, Patrizia | Ostadhassan, Mehdi |
Craciunescu, Aurelian | Pană, Adrian |
Cuerdo Vilches, María Teresa | Panepinto, Deborah |
D’Adamo, Idiano | Paul, Suvash Chandra |
Di Fazio, Anna Rita | Pawlak, Andrzej |
Dipu, Arnoldus Lambertus | Perea-Moreno, Miguel-Angel |
Dzida, Marzena | Pereira, Leonel |
El-Sayed, Marwa | Pérez-Collazo, Carlos |
Eszter, Hubainé Tóth | Pham, Hong Duc |
Ferrantelli, Andrea | Porowski, Adam |
Flores, Robert J. | Proszak-Miąsik, Danuta |
García-gracia, Miguel | Putta, Koteswara Rao |
Gil-Garcia, Isabel Cristina | Raston, Colin L |
Girolami, Flavia | Redel-Macías, María Dolores |
Goit, Jay Prakash | Remón, Javier |
Gómez-Soberón, Jose Manuel | Rodgers, Marianne |
Gullo, Paride | Sagnelli, Domenico |
Hammad, Ahmed | Salerno, Carlo |
Heift, Dominikus | Sassanelli, Claudio |
Helmi, Arash | Schirp, Arne |
Honrubia-Escribano, Andres | Schmidt, Jonas |
Howell, Bob | Shandro, Janis |
Hu, Guoping | Shao, Jiankun |
Hybská, Helena | Simões, Nádia |
Ichinose, Toshiaki | Șoimoșan, Teodora Melania |
Ihara, Takeshi | Sousa, Cristina |
Ionescu, Laurentiu Mihai | SSennoga, Twaha |
Irshad, Ahamed | Staszewski, Łukasz |
Isaev, Abdulgalim | Stechel, Ellen |
Jindrichovska, Irena | Stegenta-Dąbrowska, Sylwia |
Kang, Seongmin | Teixeira, Carlos |
Kapica, Jacek | Theristis, Marios |
Kara De Maeijer, Patricia | Tomczewski, Andrzej |
Karvelas, Evangelos | Țoniș Bucea-Manea, Rocsana |
Kasperski, Andrzej | Topor, Marcel |
Katioglu-Yazan, Tugce | Urbanik, Marek |
Khalili, Nasrin R. | Vakalis, Stergios |
Kim, Man-Hoe | Van Duijsen, Peter |
Kishore, Ravi Anant | Vaverková, Magdalena Daria |
Kotter, Richard | Viguri, Javier R. |
Kučera, Marián | Vojtisek-Lom, Michal |
Kura, Branislav | Vollprecht, Daniel |
Lau, Anthony | Vuppala, Srikanth |
Liao, Chien-Sen | Weng, Guo-Ming |
Liu, Qili | Wolny, Lidia |
Loganathan, Bommanna G. | Yoshida, Shigeo |
Luck, Rudy | Yu, Xi |
Lykidis, Charalampos | Zhou, Xiaochi (Joe) |
Manta, Otilia |
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Clean Technologies Editorial Office. Acknowledgment to Reviewers of Clean Technologies in 2020. Clean Technol. 2021, 3, 79-80. https://doi.org/10.3390/cleantechnol3010005
Clean Technologies Editorial Office. Acknowledgment to Reviewers of Clean Technologies in 2020. Clean Technologies. 2021; 3(1):79-80. https://doi.org/10.3390/cleantechnol3010005
Chicago/Turabian StyleClean Technologies Editorial Office. 2021. "Acknowledgment to Reviewers of Clean Technologies in 2020" Clean Technologies 3, no. 1: 79-80. https://doi.org/10.3390/cleantechnol3010005
APA StyleClean Technologies Editorial Office. (2021). Acknowledgment to Reviewers of Clean Technologies in 2020. Clean Technologies, 3(1), 79-80. https://doi.org/10.3390/cleantechnol3010005