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Journal: Photonics, 2025
Volume: 12
Number: 266
266
Article: Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types
Authors: by Seungchan Moon, Dong Gi Lee, Jinhyuk Choi, Junho Hong, Taeho Lee, Yasin Ekinci and Jinho Ahn
Link: https://www.mdpi.com/2304-6732/12/3/266

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