Moon, S.; Lee, D.G.; Choi, J.; Hong, J.; Lee, T.; Ekinci, Y.; Ahn, J.
Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types. Photonics 2025, 12, 266.
https://doi.org/10.3390/photonics12030266
AMA Style
Moon S, Lee DG, Choi J, Hong J, Lee T, Ekinci Y, Ahn J.
Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types. Photonics. 2025; 12(3):266.
https://doi.org/10.3390/photonics12030266
Chicago/Turabian Style
Moon, Seungchan, Dong Gi Lee, Jinhyuk Choi, Junho Hong, Taeho Lee, Yasin Ekinci, and Jinho Ahn.
2025. "Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types" Photonics 12, no. 3: 266.
https://doi.org/10.3390/photonics12030266
APA Style
Moon, S., Lee, D. G., Choi, J., Hong, J., Lee, T., Ekinci, Y., & Ahn, J.
(2025). Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types. Photonics, 12(3), 266.
https://doi.org/10.3390/photonics12030266