Article Versions Notes

Xu Y, Zhang Y, He T, Ding K, Huang X, Li H, Shi J, Guo Y, Zhang J. The Effects of Thermal and Atmospheric Pressure Radio Frequency Plasma Annealing in the Crystallization of TiO₂ Thin Films. Coatings. 2019; 9(6):357. https://doi.org/10.3390/coatings9060357

Xu, Yu, Yu Zhang, Tao He, Ke Ding, Xiaojiang Huang, Hui Li, Jianjun Shi, Ying Guo, and Jing Zhang. 2019. "The Effects of Thermal and Atmospheric Pressure Radio Frequency Plasma Annealing in the Crystallization of TiO₂ Thin Films" Coatings 9, no. 6: 357. https://doi.org/10.3390/coatings9060357

Xu, Y., Zhang, Y., He, T., Ding, K., Huang, X., Li, H., Shi, J., Guo, Y., & Zhang, J. (2019). The Effects of Thermal and Atmospheric Pressure Radio Frequency Plasma Annealing in the Crystallization of TiO₂ Thin Films. Coatings, 9(6), 357. https://doi.org/10.3390/coatings9060357