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Deposition of SiOxCyHz Protective Coatings on Polymer Substrates in an Industrial-Scale PECVD Reactor

1
Elvez Ltd, Ulica Antona Tomšiča 35, 1294 Višnja Gora, Slovenia
2
Ecotechnologies, Jozef Stefan International Postgraduate School, Jamova cesta 39, 1000 Ljubljana, Slovenia
3
Department of Surface Engineering, Jozef Stefan Institute, Jamova cesta 39, 1000 Ljubljana, Slovenia
4
Plasmadis Ltd, Teslova ulica 30, 1000 Ljubljana, Slovenia
*
Author to whom correspondence should be addressed.
Coatings 2019, 9(4), 234; https://doi.org/10.3390/coatings9040234
Received: 6 March 2019 / Revised: 29 March 2019 / Accepted: 1 April 2019 / Published: 3 April 2019
(This article belongs to the Special Issue Anticorrosion Protection of Nonmetallic and Metallic Coatings)
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Abstract

The deposition of protective coatings on aluminised polymer substrates by a plasma enhanced chemical vapour deposition PECVD technique in a plasma reactor with a volume of 5 m3 was studied. HMDSO was used as a precursor. Plasma was sustained in a capacitively coupled radiofrequency (RF) discharge powered by an RF generator operating at 40 kHz and having an adjustable output power up to 8 kW. Gaseous plasma was characterised by residual gas mass spectrometry and optical emission spectroscopy. Polymer samples with an average roughness of approximately 5 nm were mounted into the plasma reactor and subjected to a protocol for activation, metallisation and deposition of the protective coating. After depositing the protective coating, the samples were characterised by secondary ion mass spectrometry (SIMS) and X-ray photoelectron spectroscopy (XPS). The combination of various techniques for plasma and coating characterisation provided insight into the complex gas-phase and surface reactions upon deposition of the protective coatings in the industrial-size plasma reactor. View Full-Text
Keywords: plasma-enhanced chemical vapour deposition (PECVD); hexamethyldisiloxane (HMDSO); industrial-size plasma reactor; capacitively coupled radiofrequency (RF) discharge; optical emission spectroscopy (OES); time-of-flight secondary ion mass spectrometry (ToF-SIMS); X-ray photoelectron spectroscopy (XPS) plasma-enhanced chemical vapour deposition (PECVD); hexamethyldisiloxane (HMDSO); industrial-size plasma reactor; capacitively coupled radiofrequency (RF) discharge; optical emission spectroscopy (OES); time-of-flight secondary ion mass spectrometry (ToF-SIMS); X-ray photoelectron spectroscopy (XPS)
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

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Gosar, Ž.; Kovač, J.; Mozetič, M.; Primc, G.; Vesel, A.; Zaplotnik, R. Deposition of SiOxCyHz Protective Coatings on Polymer Substrates in an Industrial-Scale PECVD Reactor. Coatings 2019, 9, 234.

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