Deposition of SiOxCyHz Protective Coatings on Polymer Substrates in an Industrial-Scale PECVD Reactor
AbstractThe deposition of protective coatings on aluminised polymer substrates by a plasma enhanced chemical vapour deposition PECVD technique in a plasma reactor with a volume of 5 m3 was studied. HMDSO was used as a precursor. Plasma was sustained in a capacitively coupled radiofrequency (RF) discharge powered by an RF generator operating at 40 kHz and having an adjustable output power up to 8 kW. Gaseous plasma was characterised by residual gas mass spectrometry and optical emission spectroscopy. Polymer samples with an average roughness of approximately 5 nm were mounted into the plasma reactor and subjected to a protocol for activation, metallisation and deposition of the protective coating. After depositing the protective coating, the samples were characterised by secondary ion mass spectrometry (SIMS) and X-ray photoelectron spectroscopy (XPS). The combination of various techniques for plasma and coating characterisation provided insight into the complex gas-phase and surface reactions upon deposition of the protective coatings in the industrial-size plasma reactor. View Full-Text
- Supplementary File 1:
PDF-Document (PDF, 381 KB)
Share & Cite This Article
Gosar, Ž.; Kovač, J.; Mozetič, M.; Primc, G.; Vesel, A.; Zaplotnik, R. Deposition of SiOxCyHz Protective Coatings on Polymer Substrates in an Industrial-Scale PECVD Reactor. Coatings 2019, 9, 234.
Gosar Ž, Kovač J, Mozetič M, Primc G, Vesel A, Zaplotnik R. Deposition of SiOxCyHz Protective Coatings on Polymer Substrates in an Industrial-Scale PECVD Reactor. Coatings. 2019; 9(4):234.Chicago/Turabian Style
Gosar, Žiga; Kovač, Janez; Mozetič, Miran; Primc, Gregor; Vesel, Alenka; Zaplotnik, Rok. 2019. "Deposition of SiOxCyHz Protective Coatings on Polymer Substrates in an Industrial-Scale PECVD Reactor." Coatings 9, no. 4: 234.
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.