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Retraction published on 7 September 2018, see Coatings 2018, 8(9), 316.

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Coatings 2018, 8(2), 82; https://doi.org/10.3390/coatings8020082

Exploration of Growth Window for Phase-Pure Cubic Boron Nitride Films Prepared in a Pure N2 Plasma

State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012, China
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Author to whom correspondence should be addressed.
Received: 22 December 2017 / Revised: 21 February 2018 / Accepted: 23 February 2018 / Published: 24 February 2018
(This article belongs to the Special Issue Carbon-Related Coatings)
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Abstract

Cubic boron nitride (c-BN) films were prepared via radio frequency (RF) magnetron sputtering from a hexagonal boron nitride (h-BN) target in a pure N2 plasma. The composition and microstructure morphology of the BN films with different deposition times under pure N2 plasma or mixed Ar/N2 plasma were investigated with respect to the nucleation and growth processes. The pure-phase c-BN growth window was obtained using pure N2 gas. The effects of pure N2 gas on the growth mechanism, structural morphology, and internal compressive stress of the as-synthesized c-BN films were studied. Using pure N2 gas instead of additional Ar resulted in improved microstructure quality and much reduced compressive stress, suggesting a fundamental strategy for achieving high-quality c-BN films. View Full-Text
Keywords: cubic boron nitride; magnetron sputtering; gas composition; nucleation; substrate bias cubic boron nitride; magnetron sputtering; gas composition; nucleation; substrate bias
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Gao, W.; Li, Y.; Zhang, Y.; Yin, H. Exploration of Growth Window for Phase-Pure Cubic Boron Nitride Films Prepared in a Pure N2 Plasma. Coatings 2018, 8, 82.

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