Next Article in Journal / Special Issue
Corrosion Protection Systems and Fatigue Corrosion in Offshore Wind Structures: Current Status and Future Perspectives
Previous Article in Journal
Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material
Previous Article in Special Issue
Combustion Synthesis during Flame Spraying (“CAFSY”) for the Production of Catalysts on Substrates
 
 
Search for Articles:
Title / Keyword
Author / Affiliation / Email
Journal
Article Type
 
 
Advanced Search
 
Section
Special Issue
Volume
Issue
Number
Page
 
Journals
Coatings
Volume 7
Issue 2
10.3390/coatings7020023
coatings-logo
Submit to this Journal Review for this Journal Propose a Special Issue
► Article Menu

Article Menu

share Share announcement Help format_quote Cite question_answer Discuss in SciProfiles
first_page
settings
Order Article Reprints
Font Type:
Arial Georgia Verdana
Font Size:
Aa Aa Aa
Line Spacing:
Column Width:
Background:
Article

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

by
Isabelle Jauberteau
1,*,
Richard Mayet
1,
Julie Cornette
1,
Denis Mangin
2,
Annie Bessaudou
3,
Pierre Carles
1,
Jean Louis Jauberteau
1 and
Armand Passelergue
3
1
Faculté des Sciences et Techniques, Université de Limoges, CNRS, ENSCI, SPCTS, UMR7315, CEC, 12 rue Atlantis, F-87068 Limoges, France
2
Institut Jean Lamour, CNRS, Université de Lorraine, UMR7198, Parc de Saurupt F-54011 Nancy, France
3
Faculté des Sciences et Techniques, Université de Limoges, CNRS, XLIM, UMR6172, 123 av. A. Thomas, F-87060 Limoges, France
*
Author to whom correspondence should be addressed.
Coatings 2017, 7(2), 23; https://doi.org/10.3390/coatings7020023
Submission received: 20 September 2016 / Revised: 20 January 2017 / Accepted: 4 February 2017 / Published: 8 February 2017
(This article belongs to the Special Issue Five Years of Coatings: Coatings Science and Technology for the 21st Century)
Browse Figures
Versions Notes

Abstract

The physical properties including the mechanical, optical and electrical properties of Ti nitrides and silicides are very attractive for many applications such as protective coatings, barriers of diffusion, interconnects and so on. The simultaneous formation of nitrides and silicides in Ti films improves their electrical properties. Ti films coated on Si wafers are heated at various temperatures and processed in expanding microwave (Ar-N2-H2) plasma for various treatment durations. The Ti-Si interface is the centre of Si diffusion into the Ti lattice and the formation of various Ti silicides, while the Ti surface is the centre of N diffusion into the Ti film and the formation of Ti nitrides. The growth of silicides and nitrides gives rise to two competing processes which are thermodynamically and kinetically controlled. The effect of thickness on the kinetics of the formation of silicides is identified. The metastable C49TiSi2 phase is the main precursor of the stable C54TiSi2 phase, which crystallizes at about 600 °C, while TiN crystallizes at about 800 °C.
Keywords: expanding plasma; nitriding process; thin films; titanium silicides; titanium nitrides; X-ray diffraction; Raman spectroscopy; secondary ion mass spectrometry; transmission electron microscopy expanding plasma; nitriding process; thin films; titanium silicides; titanium nitrides; X-ray diffraction; Raman spectroscopy; secondary ion mass spectrometry; transmission electron microscopy

Share and Cite

MDPI and ACS Style

Jauberteau, I.; Mayet, R.; Cornette, J.; Mangin, D.; Bessaudou, A.; Carles, P.; Jauberteau, J.L.; Passelergue, A. Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma. Coatings 2017, 7, 23. https://doi.org/10.3390/coatings7020023

AMA Style

Jauberteau I, Mayet R, Cornette J, Mangin D, Bessaudou A, Carles P, Jauberteau JL, Passelergue A. Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma. Coatings. 2017; 7(2):23. https://doi.org/10.3390/coatings7020023

Chicago/Turabian Style

Jauberteau, Isabelle, Richard Mayet, Julie Cornette, Denis Mangin, Annie Bessaudou, Pierre Carles, Jean Louis Jauberteau, and Armand Passelergue. 2017. "Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma" Coatings 7, no. 2: 23. https://doi.org/10.3390/coatings7020023

APA Style

Jauberteau, I., Mayet, R., Cornette, J., Mangin, D., Bessaudou, A., Carles, P., Jauberteau, J. L., & Passelergue, A. (2017). Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma. Coatings, 7(2), 23. https://doi.org/10.3390/coatings7020023

Note that from the first issue of 2016, this journal uses article numbers instead of page numbers. See further details here.

Article Metrics

Back to TopTop