Vassallo, E.; Pedroni, M.; Saleh, M.; Minelli, D.; Firpo, G.; Miorin, E.; Deambrosis, S.M.; Zin, V.; Ripamonti, D.; Origo, L.
Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique. Coatings 2025, 15, 319.
https://doi.org/10.3390/coatings15030319
AMA Style
Vassallo E, Pedroni M, Saleh M, Minelli D, Firpo G, Miorin E, Deambrosis SM, Zin V, Ripamonti D, Origo L.
Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique. Coatings. 2025; 15(3):319.
https://doi.org/10.3390/coatings15030319
Chicago/Turabian Style
Vassallo, Espedito, Matteo Pedroni, Miriam Saleh, Daniele Minelli, Giuseppe Firpo, Enrico Miorin, Silvia Maria Deambrosis, Valentina Zin, Dario Ripamonti, and Luca Origo.
2025. "Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique" Coatings 15, no. 3: 319.
https://doi.org/10.3390/coatings15030319
APA Style
Vassallo, E., Pedroni, M., Saleh, M., Minelli, D., Firpo, G., Miorin, E., Deambrosis, S. M., Zin, V., Ripamonti, D., & Origo, L.
(2025). Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique. Coatings, 15(3), 319.
https://doi.org/10.3390/coatings15030319
