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Article

Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture

1
Institute of Physics, Czech Academy of Sciences, Na Slovance 2, 18221 Prague, Czech Republic
2
Faculty of Mathematics and Physics, Charles University, Ke Karlovu 3, 12116 Prague, Czech Republic
3
Institut für Physik, Universität Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany
4
Joint Laboratory of Optics, Palacky University Olomouc, Av. 17. listopadu 50A, 77207 Olomouc, Czech Republic
5
Faculty of Nuclear Sciences and Physical Engineering, Czech Technical University in Prague, Brehova 7, 11519 Prague, Czech Republic
*
Author to whom correspondence should be addressed.
Coatings 2024, 14(3), 319; https://doi.org/10.3390/coatings14030319
Submission received: 29 January 2024 / Revised: 26 February 2024 / Accepted: 1 March 2024 / Published: 6 March 2024

Abstract

Cobalt nickel oxide films are deposited on Si(111) or fluorine-doped tin-oxide-coated (FTO) glass substrates employing a pulsed hollow-cathode discharge. The hollow cathode is operated with argon gas flowing through the nozzle and with O2 gas admitted to the vacuum chamber. Three different cathode compositions (Co20Ni80, Co50Ni50, and Co80Ni20) are investigated. Deposited and annealed thin films are characterized by X-ray diffraction, infrared (Raman) spectroscopy, and ellipsometry. As-deposited films consist of a single mixed cobalt nickel oxide phase. Upon annealing at 600 °C, the mixed cobalt nickel oxide phase separates into two cystalline sub-phases which consist of cubic NiO and cubic Co3O4. Annealed films are investigated by spectroscopic ellipsometry and the optical bandgaps are determined.
Keywords: hollow-cathode discharge; mixed cobalt nickel oxide film; refractive index; absorption coefficient; optical bandgap hollow-cathode discharge; mixed cobalt nickel oxide film; refractive index; absorption coefficient; optical bandgap

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MDPI and ACS Style

Kapran, A.; Hippler, R.; Wulff, H.; Olejnicek, J.; Volfova, L.; Pisarikova, A.; Nepomniashchaia, N.; Cada, M.; Hubicka, Z. Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture. Coatings 2024, 14, 319. https://doi.org/10.3390/coatings14030319

AMA Style

Kapran A, Hippler R, Wulff H, Olejnicek J, Volfova L, Pisarikova A, Nepomniashchaia N, Cada M, Hubicka Z. Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture. Coatings. 2024; 14(3):319. https://doi.org/10.3390/coatings14030319

Chicago/Turabian Style

Kapran, Anna, Rainer Hippler, Harm Wulff, Jiri Olejnicek, Lenka Volfova, Aneta Pisarikova, Natalia Nepomniashchaia, Martin Cada, and Zdenek Hubicka. 2024. "Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture" Coatings 14, no. 3: 319. https://doi.org/10.3390/coatings14030319

APA Style

Kapran, A., Hippler, R., Wulff, H., Olejnicek, J., Volfova, L., Pisarikova, A., Nepomniashchaia, N., Cada, M., & Hubicka, Z. (2024). Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O2 Gas Mixture. Coatings, 14(3), 319. https://doi.org/10.3390/coatings14030319

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