Low-Temperature Epitaxial Growth of AlN Thin Films on a Mo Electrode/Sapphire Substrate Using Reactive Sputtering
Abstract
1. Introduction
2. Experimental
3. Results and Discussion
4. Conclusions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
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Kim, J. Low-Temperature Epitaxial Growth of AlN Thin Films on a Mo Electrode/Sapphire Substrate Using Reactive Sputtering. Coatings 2021, 11, 443. https://doi.org/10.3390/coatings11040443
Kim J. Low-Temperature Epitaxial Growth of AlN Thin Films on a Mo Electrode/Sapphire Substrate Using Reactive Sputtering. Coatings. 2021; 11(4):443. https://doi.org/10.3390/coatings11040443
Chicago/Turabian StyleKim, Jihong. 2021. "Low-Temperature Epitaxial Growth of AlN Thin Films on a Mo Electrode/Sapphire Substrate Using Reactive Sputtering" Coatings 11, no. 4: 443. https://doi.org/10.3390/coatings11040443
APA StyleKim, J. (2021). Low-Temperature Epitaxial Growth of AlN Thin Films on a Mo Electrode/Sapphire Substrate Using Reactive Sputtering. Coatings, 11(4), 443. https://doi.org/10.3390/coatings11040443