Lee, Y.-S.;                     Wang, Y.-H.;                     Tien, T.-C.;                     Hsieh, T.-E.;                     Lai, C.-H.    
        Electrical Characteristics and Stability Improvement of Top-Gate In-Ga-Zn-O Thin-Film Transistors with Al2O3/TEOS Oxide Gate Dielectrics. Coatings 2020, 10, 1146.
    https://doi.org/10.3390/coatings10121146
    AMA Style
    
                                Lee Y-S,                                 Wang Y-H,                                 Tien T-C,                                 Hsieh T-E,                                 Lai C-H.        
                Electrical Characteristics and Stability Improvement of Top-Gate In-Ga-Zn-O Thin-Film Transistors with Al2O3/TEOS Oxide Gate Dielectrics. Coatings. 2020; 10(12):1146.
        https://doi.org/10.3390/coatings10121146
    
    Chicago/Turabian Style
    
                                Lee, Yih-Shing,                                 Yu-Hsin Wang,                                 Tsung-Cheng Tien,                                 Tsung-Eong Hsieh,                                 and Chun-Hung Lai.        
                2020. "Electrical Characteristics and Stability Improvement of Top-Gate In-Ga-Zn-O Thin-Film Transistors with Al2O3/TEOS Oxide Gate Dielectrics" Coatings 10, no. 12: 1146.
        https://doi.org/10.3390/coatings10121146
    
    APA Style
    
                                Lee, Y.-S.,                                 Wang, Y.-H.,                                 Tien, T.-C.,                                 Hsieh, T.-E.,                                 & Lai, C.-H.        
        
        (2020). Electrical Characteristics and Stability Improvement of Top-Gate In-Ga-Zn-O Thin-Film Transistors with Al2O3/TEOS Oxide Gate Dielectrics. Coatings, 10(12), 1146.
        https://doi.org/10.3390/coatings10121146