Lee, Y.-S.; Wang, Y.-H.; Tien, T.-C.; Hsieh, T.-E.; Lai, C.-H.
Electrical Characteristics and Stability Improvement of Top-Gate In-Ga-Zn-O Thin-Film Transistors with Al2O3/TEOS Oxide Gate Dielectrics. Coatings 2020, 10, 1146.
https://doi.org/10.3390/coatings10121146
AMA Style
Lee Y-S, Wang Y-H, Tien T-C, Hsieh T-E, Lai C-H.
Electrical Characteristics and Stability Improvement of Top-Gate In-Ga-Zn-O Thin-Film Transistors with Al2O3/TEOS Oxide Gate Dielectrics. Coatings. 2020; 10(12):1146.
https://doi.org/10.3390/coatings10121146
Chicago/Turabian Style
Lee, Yih-Shing, Yu-Hsin Wang, Tsung-Cheng Tien, Tsung-Eong Hsieh, and Chun-Hung Lai.
2020. "Electrical Characteristics and Stability Improvement of Top-Gate In-Ga-Zn-O Thin-Film Transistors with Al2O3/TEOS Oxide Gate Dielectrics" Coatings 10, no. 12: 1146.
https://doi.org/10.3390/coatings10121146
APA Style
Lee, Y.-S., Wang, Y.-H., Tien, T.-C., Hsieh, T.-E., & Lai, C.-H.
(2020). Electrical Characteristics and Stability Improvement of Top-Gate In-Ga-Zn-O Thin-Film Transistors with Al2O3/TEOS Oxide Gate Dielectrics. Coatings, 10(12), 1146.
https://doi.org/10.3390/coatings10121146