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Article

Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection

1
Institute of Biomedical Chemistry (IBMC), Moscow 119121, Russia
2
Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk 630090, Russia
3
Institute of Physics and Technology of Russian Academy of Sciences, Moscow 117218, Russia
4
Joint-Stock Company “Novosibirsk Plant of Semiconductor Devices & DC”, Novosibirsk 630082, Russia
5
Sobolev Institute of Geology and Mineralogy, Siberian Branch of Russian Academy of Sciences, Novosibirsk 630090, Russia
6
Skryabin Moscow State Academy of Veterinary Medicine and Biotechnology, Moscow 109472, Russia
*
Author to whom correspondence should be addressed.
Biosensors 2018, 8(3), 72; https://doi.org/10.3390/bios8030072
Received: 28 June 2018 / Revised: 23 July 2018 / Accepted: 25 July 2018 / Published: 27 July 2018
(This article belongs to the Special Issue Applications of Raman Techniques in Biosensing)
Application of micro-Raman spectroscopy for the monitoring of quality of high-k (h-k) dielectric protective layer deposition onto the surface of a nanowire (NW) chip has been demonstrated. A NW chip based on silicon-on-insulator (SOI) structures, protected with a layer of high-k dielectric ((h-k)-SOI-NW chip), has been employed for highly sensitive detection of microRNA (miRNA) associated with oncological diseases. The protective dielectric included a 2-nm-thick Al2O3 surface layer and a 8-nm-thick HfO2 layer, deposited onto a silicon SOI-NW chip. Such a chip had increased time stability upon operation in solution, as compared with an unprotected SOI-NW chip with native oxide. The (h-k)-SOI-NW biosensor has been employed for the detection of DNA oligonucleotide (oDNA), which is a synthetic analogue of miRNA-21 associated with oncological diseases. To provide biospecificity of the detection, the surface of (h-k)-SOI-NW chip was modified with oligonucleotide probe molecules (oDVA probes) complementary to the sequence of the target biomolecule. Concentration sensitivity of the (h-k)-SOI-NW biosensor at the level of DL~10−16 M has been demonstrated. View Full-Text
Keywords: silicon-on-insulator; high-k dielectric; nanowire biosensor; micro-Raman spectroscopy; miRNA silicon-on-insulator; high-k dielectric; nanowire biosensor; micro-Raman spectroscopy; miRNA
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MDPI and ACS Style

Malsagova, K.A.; Pleshakova, T.O.; Kozlov, A.F.; Shumov, I.D.; Ilnitskii, M.A.; Miakonkikh, A.V.; Popov, V.P.; Rudenko, K.V.; Glukhov, A.V.; Kupriyanov, I.N.; Ivanova, N.D.; Rogozhin, A.E.; Archakov, A.I.; Ivanov, Y.D. Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection. Biosensors 2018, 8, 72. https://doi.org/10.3390/bios8030072

AMA Style

Malsagova KA, Pleshakova TO, Kozlov AF, Shumov ID, Ilnitskii MA, Miakonkikh AV, Popov VP, Rudenko KV, Glukhov AV, Kupriyanov IN, Ivanova ND, Rogozhin AE, Archakov AI, Ivanov YD. Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection. Biosensors. 2018; 8(3):72. https://doi.org/10.3390/bios8030072

Chicago/Turabian Style

Malsagova, Kristina A.; Pleshakova, Tatyana O.; Kozlov, Andrey F.; Shumov, Ivan D.; Ilnitskii, Mikhail A.; Miakonkikh, Andrew V.; Popov, Vladimir P.; Rudenko, Konstantin V.; Glukhov, Alexander V.; Kupriyanov, Igor N.; Ivanova, Nina D.; Rogozhin, Alexander E.; Archakov, Alexander I.; Ivanov, Yuri D. 2018. "Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection" Biosensors 8, no. 3: 72. https://doi.org/10.3390/bios8030072

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