Article Versions Notes

Ma H-P, Yang J-H, Yang J-G, Zhu L-Y, Huang W, Yuan G-J, Feng J-J, Jen T-C, Lu H-L. Systematic Study of the SiO_x Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiO_x/SiO₂ Super-Lattice. Nanomaterials. 2019; 9(1):55. https://doi.org/10.3390/nano9010055

Ma, Hong-Ping, Jia-He Yang, Jian-Guo Yang, Li-Yuan Zhu, Wei Huang, Guang-Jie Yuan, Ji-Jun Feng, Tien-Chien Jen, and Hong-Liang Lu. 2019. "Systematic Study of the SiO_x Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiO_x/SiO₂ Super-Lattice" Nanomaterials 9, no. 1: 55. https://doi.org/10.3390/nano9010055

Ma, H.-P., Yang, J.-H., Yang, J.-G., Zhu, L.-Y., Huang, W., Yuan, G.-J., Feng, J.-J., Jen, T.-C., & Lu, H.-L. (2019). Systematic Study of the SiO_x Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiO_x/SiO₂ Super-Lattice. Nanomaterials, 9(1), 55. https://doi.org/10.3390/nano9010055