Luo, W.; Yin, Y.; Huang, Q.; Yang, J.; Zhan, Y.; Liu, Z.; Jiang, Z.; Zheng, C.; Zhong, Z.
Engineering Properties of GeSi Alloy Quantum Dots by High-Temperature Annealing. Nanomaterials 2026, 16, 736.
https://doi.org/10.3390/nano16120736
AMA Style
Luo W, Yin Y, Huang Q, Yang J, Zhan Y, Liu Z, Jiang Z, Zheng C, Zhong Z.
Engineering Properties of GeSi Alloy Quantum Dots by High-Temperature Annealing. Nanomaterials. 2026; 16(12):736.
https://doi.org/10.3390/nano16120736
Chicago/Turabian Style
Luo, Wei, Yang Yin, Qiang Huang, Jingpu Yang, Yan Zhan, Zitong Liu, Zuimin Jiang, Changlin Zheng, and Zhenyang Zhong.
2026. "Engineering Properties of GeSi Alloy Quantum Dots by High-Temperature Annealing" Nanomaterials 16, no. 12: 736.
https://doi.org/10.3390/nano16120736
APA Style
Luo, W., Yin, Y., Huang, Q., Yang, J., Zhan, Y., Liu, Z., Jiang, Z., Zheng, C., & Zhong, Z.
(2026). Engineering Properties of GeSi Alloy Quantum Dots by High-Temperature Annealing. Nanomaterials, 16(12), 736.
https://doi.org/10.3390/nano16120736