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Journal: Nanomaterials, 2022
Volume: 12
Number: 3828
3828
Article: Database Development of SiO₂ Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe
Authors: by Youngseok Lee, Heejung Yeom, Daehan Choi, Sijun Kim, Jangjae Lee, Junghyung Kim, Hyochang Lee and ShinJae You
Link: https://www.mdpi.com/2079-4991/12/21/3828

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