Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography
Wi, S.J.; Jang, Y.J.; Kim, H.; Cho, K.; Ahn, J. Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography. Membranes 2022, 12, 367. https://doi.org/10.3390/membranes12040367
Wi SJ, Jang YJ, Kim H, Cho K, Ahn J. Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography. Membranes. 2022; 12(4):367. https://doi.org/10.3390/membranes12040367
Chicago/Turabian StyleWi, Seong Ju, Yong Ju Jang, Haneul Kim, Kyeongjae Cho, and Jinho Ahn. 2022. "Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography" Membranes 12, no. 4: 367. https://doi.org/10.3390/membranes12040367