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Article

Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography

by 1,2, 2,3, 1,2, 4 and 1,2,3,*
1
Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Korea
2
EUV-IUCC (Industry University Cooperation Center), Hanuyang University, Seoul 04763, Korea
3
Division of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Korea
4
Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX 75080, USA
*
Author to whom correspondence should be addressed.
Academic Editor: Stephanos Nitodas
Membranes 2022, 12(4), 367; https://doi.org/10.3390/membranes12040367
Received: 23 February 2022 / Revised: 23 March 2022 / Accepted: 25 March 2022 / Published: 26 March 2022
(This article belongs to the Special Issue Nanotechnology and Hybrid Membranes)
A pellicle is a thin membrane structure that protects an extreme ultraviolet (EUV) mask from contamination during the exposure process. However, its limited transmittance induces unwanted heating owing to the absorption of EUV photons. The rupture of the EUV pellicle can be avoided by improving its thermal stability, which is achieved by improving the emissivity of the film. However, the emissivity data for thin films are not easily available in the literature, and its value is very sensitive to thickness. Therefore, we investigated the dependence of emissivity on structural parameters, such as thickness, surface roughness, and grain size. We found a correlation between resistivity and emissivity using theoretical and experimental approaches. By changing the grain size of the Ru thin film, the relationship between resistivity and emissivity was experimentally verified and confirmed using the Lorentz–Drude model. Finally, we present a method to develop an EUV pellicle with better thermal stability that can withstand high-power EUV light sources. View Full-Text
Keywords: EUV pellicle; emissivity; Lorentz–Drude model; resistivity; grain size; membrane EUV pellicle; emissivity; Lorentz–Drude model; resistivity; grain size; membrane
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MDPI and ACS Style

Wi, S.J.; Jang, Y.J.; Kim, H.; Cho, K.; Ahn, J. Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography. Membranes 2022, 12, 367. https://doi.org/10.3390/membranes12040367

AMA Style

Wi SJ, Jang YJ, Kim H, Cho K, Ahn J. Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography. Membranes. 2022; 12(4):367. https://doi.org/10.3390/membranes12040367

Chicago/Turabian Style

Wi, Seong Ju, Yong Ju Jang, Haneul Kim, Kyeongjae Cho, and Jinho Ahn. 2022. "Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography" Membranes 12, no. 4: 367. https://doi.org/10.3390/membranes12040367

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