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Journal: Appl. Sci., 2019
Volume: 9
Number: 3163
Article:
Comparison of Various Factors Affected TID Tolerance in FinFET and Nanowire FET
Authors:
by
Hyeonjae Won, Ilsik Ham, Youngseok Jeong and Myounggon Kang
Link:
https://www.mdpi.com/2076-3417/9/15/3163
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