Article Versions Notes

Ma B, Ma K, Qin X, Xi Y, Zhang J, Yang X, Yang P, Liu W. Effect of Hafnium-Based Thin Film Thickness on Microstructure and Electrical of Yttrium-Doped Hafnium Oxide Ferroelectric Devices Prepared by Magnetron Sputtering. Micromachines. 2025; 16(9):1066. https://doi.org/10.3390/mi16091066

Ma, Bei, Ke Ma, Xinhui Qin, Yingxue Xi, Jin Zhang, Xinyu Yang, Pengfei Yang, and Weiguo Liu. 2025. "Effect of Hafnium-Based Thin Film Thickness on Microstructure and Electrical of Yttrium-Doped Hafnium Oxide Ferroelectric Devices Prepared by Magnetron Sputtering" Micromachines 16, no. 9: 1066. https://doi.org/10.3390/mi16091066

Ma, B., Ma, K., Qin, X., Xi, Y., Zhang, J., Yang, X., Yang, P., & Liu, W. (2025). Effect of Hafnium-Based Thin Film Thickness on Microstructure and Electrical of Yttrium-Doped Hafnium Oxide Ferroelectric Devices Prepared by Magnetron Sputtering. Micromachines, 16(9), 1066. https://doi.org/10.3390/mi16091066