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Journal: MicromachinesVolume: 16Number: 1202
Article: In Situ Raman Measurement of the Growth of SiCOH Thin Film Using Hexamethyl-Disiloxane (HMDSO) Mixture Source in Semiconductor Interconnection
- Authors:
- Hwa Rim Lee,
- Tae Min Choi and
- Sung Gyu Pyo*
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