A Miniature Four-Channel Ion Trap Array Based on Non-silicon MEMS Technology
Abstract
:1. Introduction
2. Materials and Methods
2.1. Structure and Fabrication
- <i>
- Choose a three-inch FR-4 board substrate and clean it;
- <ii>
- Use AZ 4330 photoresist on the substrate to homogenize and pattern, and then sputter Cr/Cu as the electroplating seed layer;
- <iii>
- Use the lift-off process to remove the photoresist, leaving the Cr/Cu seed layer;
- <iv>
- Use AZ 4903 photoresist to homogenize and pattern;
- <v>
- Electroplate 50 μm copper as an electrode on the seed layer;
- <vi>
- Use backside alignment lithography technology, repeat b–e steps on the backside of the substrate to fabricate backside electrodes;
- <vii>
- Use wet etching process to remove the photoresist and seed layer, leaving the electrode, and sanding the electrode with water to ensure uniformity of surface;
- <viii>
- Use FP/FPS ultraviolet micro-processing system and IGE glass fiber laser high-speed equipment to cut out ion exit slots and connect wires. Use MicroVector ultraviolet laser FPC cutting machine to cut the copper sheet as the y-direction electrode and end cap electrode, insert the electrode slot to assemble the ion trap array.
2.2. Configuration of Simulation
3. Results and Discussion
3.1. Parameter Optimization
3.2. Mass Spectrometry Experiment
4. Conclusions
Supplementary Materials
Author Contributions
Funding
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
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Zhang, Q.; Lu, X.; Chen, T.; Xiao, Y.; Yao, R.; Yao, J. A Miniature Four-Channel Ion Trap Array Based on Non-silicon MEMS Technology. Micromachines 2021, 12, 831. https://doi.org/10.3390/mi12070831
Zhang Q, Lu X, Chen T, Xiao Y, Yao R, Yao J. A Miniature Four-Channel Ion Trap Array Based on Non-silicon MEMS Technology. Micromachines. 2021; 12(7):831. https://doi.org/10.3390/mi12070831
Chicago/Turabian StyleZhang, Qi, Xichi Lu, Ting Chen, Yu Xiao, Rujiao Yao, and Jinyuan Yao. 2021. "A Miniature Four-Channel Ion Trap Array Based on Non-silicon MEMS Technology" Micromachines 12, no. 7: 831. https://doi.org/10.3390/mi12070831