Next Article in Journal
Can 3D Printing Bring Droplet Microfluidics to Every Lab?—A Systematic Review
Next Article in Special Issue
Damage Effect of ALD-Al2O3 Based Metal-Oxide-Semiconductor Structures under Gamma-Ray Irradiation
Previous Article in Journal
Triboelectric Effect Enabled Self-Powered, Point-of-Care Diagnostics: Opportunities for Developing ASSURED and REASSURED Devices
Previous Article in Special Issue
Transparent and Flexible SiOC Films on Colorless Polyimide Substrate for Flexible Cover Window
 
 
Search for Articles:
Title / Keyword
Author / Affiliation / Email
Journal
Article Type
 
 
Advanced Search
 
Section
Special Issue
Volume
Issue
Number
Page
 
Journals
Micromachines
Volume 12
Issue 3
10.3390/mi12030338
Review Report
micromachines-logo
Submit to this Journal Review for this Journal Propose a Special Issue
► Article Menu

Article Menu

share Share announcement Help format_quote Cite question_answer Discuss in SciProfiles
Article
Peer-Review Record

Optimal n-Type Al-Doped ZnO Overlayers for Charge Transport Enhancement in p-Type Cu2O Photocathodes

Micromachines 2021, 12(3), 338; https://doi.org/10.3390/mi12030338
by Hak Hyeon Lee 1,†, Dong Su Kim 1,†, Ji Hoon Choi 1, Young Been Kim 1, Sung Hyeon Jung 1, Swagotom Sarker 2, Nishad G. Deshpande 2, Hee Won Suh 1 and Hyung Koun Cho 1,*
Reviewer 1: Anonymous
Reviewer 2: Anonymous
Micromachines 2021, 12(3), 338; https://doi.org/10.3390/mi12030338
Submission received: 23 February 2021 / Revised: 15 March 2021 / Accepted: 17 March 2021 / Published: 22 March 2021
(This article belongs to the Special Issue Oxide Semiconductors-Based Devices: Design, Fabrication, and Applications)

Round 1

Reviewer 1 Report

See the attached document.

Comments for author File: Comments.docx

Author Response

Please see the attachment

Author Response File: Author Response.docx

Reviewer 2 Report

 The manuscript “Optimal n-type Al-doped ZnO overlayers for charge transport enhancement in p-type Cu2O photocathodes “ by : Hak Hyeon Lee, Dong Su Kim, Ji Hoon Choi, Young Been Kim, Sung Hyeon Jung, Swagotom Sarker, Nishad G. Deshpande , Hee Won Suh and Hyung Koun Cho is devoted to study the influence of Al-doped ZnO overlayers on photoelectrochemical performance of Cu2O photocatodes. Authors clamed that the Cu2O/AZO electrodes show better performance than the Cu2O/ZnO electrode with a current of > 1.6 mA cm-2 at 0.

There are some mistakes:

1) It is known that ZnO and Al-doped ZnO thin layers growth by ALD system has a good conductivity. However the high resistivity of layers depicted in Figure 3(b) are not real.

2) In Figures 2(c) and 2(d) the values of (αհν) are not correct. Also in Figure 2 (a) and (b) the absorbance is needed to show in real unit for credibility.

Therefore, major revision is required for this manuscript before publication.

Author Response

Please see the attachment

Author Response File: Author Response.docx

Round 2

Reviewer 2 Report

The manuscript “Optimal n-type Al-doped ZnO overlayers for charge transport enhancement in p-type Cu2O photocathodes “ by : Hak Hyeon Lee, Dong Su Kim, Ji Hoon Choi, Young Been Kim, Sung Hyeon Jung, Swagotom Sarker, Nishad G. Deshpande , Hee Won Suh and Hyung Koun Cho has been slightly improved. However, it will be noted that the values of (αհν) (see Figures 2(d)) are different from known in the literature (such as, Tai Nguen et al. Results in materials 6 (2020) 100088). A discussion is highly desirable. The authors don´t take into account my remark „in Figure 2 (a) and (b) the absorbance is needed to show in real unit for credibility”

 

Thereby, I think the manuscript can be published in Micromachines after a revision.

Author Response

Please see the attachment.

Author Response File: Author Response.docx

Back to TopTop