Development of Proportional–Integrative–Derivative (PID) Optimized for the MicroElectric Discharge Machine Fabrication of Nano-Bismuth Colloid
Abstract
Share and Cite
Tseng, K.-H.; Chang, C.-Y.; Cahyadi, Y.; Chung, M.-Y.; Hsieh, C.-L. Development of Proportional–Integrative–Derivative (PID) Optimized for the MicroElectric Discharge Machine Fabrication of Nano-Bismuth Colloid. Micromachines 2020, 11, 1065. https://doi.org/10.3390/mi11121065
Tseng K-H, Chang C-Y, Cahyadi Y, Chung M-Y, Hsieh C-L. Development of Proportional–Integrative–Derivative (PID) Optimized for the MicroElectric Discharge Machine Fabrication of Nano-Bismuth Colloid. Micromachines. 2020; 11(12):1065. https://doi.org/10.3390/mi11121065
Chicago/Turabian StyleTseng, Kuo-Hsiung, Chaur-Yang Chang, Yagus Cahyadi, Meng-Yun Chung, and Chin-Liang Hsieh. 2020. "Development of Proportional–Integrative–Derivative (PID) Optimized for the MicroElectric Discharge Machine Fabrication of Nano-Bismuth Colloid" Micromachines 11, no. 12: 1065. https://doi.org/10.3390/mi11121065
APA StyleTseng, K.-H., Chang, C.-Y., Cahyadi, Y., Chung, M.-Y., & Hsieh, C.-L. (2020). Development of Proportional–Integrative–Derivative (PID) Optimized for the MicroElectric Discharge Machine Fabrication of Nano-Bismuth Colloid. Micromachines, 11(12), 1065. https://doi.org/10.3390/mi11121065

