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Journal: Micromachines, 2020
Volume: 11
Number: 88
88
Article: Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiN_x for Low Temperature Thin Film Encapsulation
Authors: by Kunsik An, Ho-Nyun Lee, Kwan Hyun Cho, Seung-Woo Lee, David J. Hwang and Kyung-Tae Kang
Link: https://www.mdpi.com/2072-666X/11/1/88

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