Conformal SiNx Coating on Carbon Nanotubes via Transient UV–Ozone Functionalization and Two-Step Atomic Layer Deposition
Abstract
1. Introduction
2. Materials and Methods
2.1. UV–Ozone Surface Functionalization of CNT Membranes
2.2. Thermal ALD of SiNx
2.3. Chemical and Structural Characterization
3. Results and Discussion
3.1. UV–Ozone-Induced Functionalization of CNTs
3.2. Chemical Analysis of UV–Ozone Functionalized CNT Surfaces
3.3. Effect of UV–Ozone Functionalization on ALD Coating Behavior and Structural Recovery
4. Conclusions
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
Abbreviations
| CNT | Carbon nanotube |
| ALD | Atomic layer deposition |
| EUV | Extreme ultraviolet |
| XPS | X-ray photoelectron spectroscopy |
| SEM | Scanning electron microscopy |
| TEM | Transmission electron microscopy |
References
- Li, Y. Carbon Nanotube Research in Its 30th Year. ACS Nano 2021, 15, 9197–9200. [Google Scholar] [CrossRef]
- Tasis, D.; Tagmatarchis, N.; Bianco, A.; Prato, M. Chemistry of Carbon Nanotubes. Chem. Rev. 2006, 106, 1105–1136. [Google Scholar] [CrossRef] [PubMed]
- Rashid, M.H.; Ralph, S.F. Carbon Nanotube Membranes: Synthesis, Properties, and Future Filtration Applications. Nanomaterials 2017, 7, 99. [Google Scholar] [CrossRef] [PubMed]
- Norizan, M.N.; Moklis, M.H.; Ngah Demon, S.Z.; Halim, N.A.; Samsuri, A.; Mohamad, I.S.; Knight, V.F.; Abdullah, N. Carbon nanotubes: Functionalisation and their application in chemical sensors. RSC Adv. 2020, 10, 43704–43732. [Google Scholar] [CrossRef] [PubMed]
- Pan, H.; Li, J.; Feng, Y. Carbon nanotubes for supercapacitor. Nanoscale Res. Lett. 2010, 5, 654–668. [Google Scholar] [CrossRef]
- Gubarev, V.M.; Yakovlev, V.Y.; Sertsu, M.G.; Yakushev, O.F.; Krivtsun, V.M.; Gladush, Y.G.; Ostanin, I.A.; Sokolov, A.; Schäfers, F.; Medvedev, V.V.; et al. Single-walled carbon nanotube membranes for optical applications in the extreme ultraviolet range. Carbon 2019, 155, 734–739. [Google Scholar] [CrossRef]
- van de Kerkhof, M.; Yakunin, A.; Astakhov, D.; van Kampen, M.; van der Horst, R.; Banine, V. EUV-induced hydrogen plasma: Pulsed mode operation and confinement in scanner. J. Micro/Nanopattern. Mats. Metro. 2021, 20, 033801. [Google Scholar] [CrossRef]
- Nozaki, T.; Yoshida, S.; Okazaki, K. Plasma-induced damage and surface functionalization of double-walled carbon nanotubes using atmospheric pressure RF discharge. Plasma Process. Polym. 2012, 9, 1154–1159. [Google Scholar] [CrossRef]
- Bekaert, J.; Gallagher, E.; Timmermans, M.; Pollentier, I.; Jonckheere, R.; Aubert, R.; Hendrickx, E. CNT Pellicles: Recent Optimization and Exposure Results. In Proceedings of the Optical and EUV Nanolithography XXXVI; SPIE: Bellingham, WA, USA, 2023. [Google Scholar]
- Timmermans, M.Y.; Pollentier, I.; Korytov, M.; Nuytten, T.; Sergeant, S.; Conard, T.; Meersschaut, J.; Zhang, Y.; Dialameh, M.; Alaerts, W.; et al. Carbon nanotube EUV pellicle tunability and performance in a scanner-like environment. J. Micro/Nanopattern. Mats. Metro. 2021, 20, 031010. [Google Scholar] [CrossRef]
- George, S.M. Atomic Layer Deposition: An Overview. Chem. Rev. 2010, 110, 111–131. [Google Scholar] [CrossRef]
- Wang, X.; Tabakman, S.M.; Dai, H. Atomic Layer Deposition of Metal Oxides on Pristine and Functionalized Graphene. J. Am. Chem. Soc. 2008, 130, 8152–8153. [Google Scholar] [CrossRef]
- Kemelbay, A.; Tikhonov, A.; Aloni, S.; Kuykendall, T.R. Conformal High-K Dielectric Coating of Suspended Single-Walled Carbon Nanotubes by Atomic Layer Deposition. Nanomaterials 2019, 9, 1085. [Google Scholar] [CrossRef] [PubMed]
- Wepasnick, K.A.; Smith, B.A.; Schrote, K.E.; Wilson, H.K.; Diegelmann, S.R.; Fairbrother, D.H. Surface and structural characterization of multi-walled carbon nanotubes following different oxidative treatments. Carbon 2011, 49, 24–36. [Google Scholar] [CrossRef]
- Vervuurt, R.H.J.; Kessels, W.M.M.; Bol, A.A. Atomic Layer Deposition for Graphene Device Integration. Adv. Mater. Interfaces 2017, 4, 1700232. [Google Scholar] [CrossRef]
- Snure, M.; Vangala, S.R.; Prusnick, T.; Grzybowski, G.; Crespo, A.; Leedy, K.D. Two-dimensional BN buffer for plasma enhanced atomic layer deposition of Al2O3 gate dielectrics on graphene field effect transistors. Sci. Rep. 2020, 10, 14699. [Google Scholar] [CrossRef]
- Park, J.S.; Park, J.Y.; Jang, D.H.; Kim, J.S.; Choi, M.; Kang, Y.; Kang, J.W.; Kim, D.K.; Lee, Y.; Cho, Y.S.; et al. Nano-percolation engineering of carbon nanotube films for ultra-high transmittance exceeding 99%. Chem. Eng. J. 2026, 528, 172247. [Google Scholar] [CrossRef]
- Kang, Y.W.; Kim, H.; Lee, I.; Lee, T.; Park, I.-S.; Ahn, J. Thermal atomic layer deposition of SiNx protective coatings for hydrogen plasma-resistant carbon nanotube pellicles. Appl. Surf. Sci. 2026, 738, 166963. [Google Scholar] [CrossRef]
- Simmons, J.M.; Nichols, B.M.; Baker, S.E.; Marcus, M.S.; Castellini, O.M.; Lee, C.S.; Hamers, R.J.; Eriksson, M.A. Effect of Ozone Oxidation on Single-Walled Carbon Nanotubes. J. Phys. Chem. B 2006, 110, 7113–7118. [Google Scholar] [CrossRef] [PubMed]
- Murphy, H.; Papakonstantinou, P.; Okpalugo, T.I.T. Raman study of multiwalled carbon nanotubes functionalized with oxygen groups. J. Vac. Sci. Technol. B 2006, 24, 715–720. [Google Scholar] [CrossRef]
- Sammalkorpi, M.; Krasheninnikov, A.; Kuronen, A.; Nordlund, K.; Kaski, K. Mechanical properties of carbon nanotubes with vacancies and related defects. Phys. Rev. B 2004, 70, 245416. [Google Scholar] [CrossRef]
- Humayun, M.T.; Sainato, M.; Divan, R.; Rosenberg, R.A.; Sahagun, A.; Gundel, L.; Solomon, P.A.; Paprotny, I. Effects of O2 plasma and UV-O3 assisted surface activation on high sensitivity metal oxide functionalized multiwalled carbon nanotube CH4 sensors. J. Vac. Sci. Technol. A 2017, 35, 061402. [Google Scholar] [CrossRef]
- Kundu, S.; Wang, Y.; Xia, W.; Muhler, M. Thermal Stability and Reducibility of Oxygen-Containing Functional Groups on Multiwalled Carbon Nanotube Surfaces: A Quantitative High-Resolution XPS and TPD/TPR Study. J. Phys. Chem. C 2008, 112, 16869–16878. [Google Scholar] [CrossRef]
- Najafi, E.; Kim, J.-Y.; Han, S.-H.; Shin, K. UV-ozone treatment of multi-walled carbon nanotubes for enhanced organic solvent dispersion. Colloids Surf. A Physicochem. Eng. Asp. 2006, 284–285, 373–378. [Google Scholar] [CrossRef]
- Oliveira, I.E.; Silva, R.M.; Rodrigues, J.; Correia, M.R.; Monteiro, T.; Faria, J.L.; Silva, R.F.; Silva, C.G. Impact of atomic layer deposited TiO2 on the photocatalytic efficiency of TiO2/w-VA-CNT nanocomposite materials. RSC Adv. 2022, 12, 16419–16430. [Google Scholar] [CrossRef] [PubMed]








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Kang, Y.W.; Kim, H.; Lee, I.; Kim, Y.; Park, I.-S.; Ahn, J. Conformal SiNx Coating on Carbon Nanotubes via Transient UV–Ozone Functionalization and Two-Step Atomic Layer Deposition. Materials 2026, 19, 1919. https://doi.org/10.3390/ma19101919
Kang YW, Kim H, Lee I, Kim Y, Park I-S, Ahn J. Conformal SiNx Coating on Carbon Nanotubes via Transient UV–Ozone Functionalization and Two-Step Atomic Layer Deposition. Materials. 2026; 19(10):1919. https://doi.org/10.3390/ma19101919
Chicago/Turabian StyleKang, Young Woo, Haneul Kim, Inseo Lee, Yongkyung Kim, In-Sung Park, and Jinho Ahn. 2026. "Conformal SiNx Coating on Carbon Nanotubes via Transient UV–Ozone Functionalization and Two-Step Atomic Layer Deposition" Materials 19, no. 10: 1919. https://doi.org/10.3390/ma19101919
APA StyleKang, Y. W., Kim, H., Lee, I., Kim, Y., Park, I.-S., & Ahn, J. (2026). Conformal SiNx Coating on Carbon Nanotubes via Transient UV–Ozone Functionalization and Two-Step Atomic Layer Deposition. Materials, 19(10), 1919. https://doi.org/10.3390/ma19101919
