Węgłowski, R.; Mrukiewicz, M.; Węgłowska, D.; Liszewska, M.; Bartosewicz, B.; Chlanda, A.; Spadło, A.
Characterization of Modified DNA-Based Polymer Alignment Layers for Photonic Applications. Materials 2025, 18, 2760.
https://doi.org/10.3390/ma18122760
AMA Style
Węgłowski R, Mrukiewicz M, Węgłowska D, Liszewska M, Bartosewicz B, Chlanda A, Spadło A.
Characterization of Modified DNA-Based Polymer Alignment Layers for Photonic Applications. Materials. 2025; 18(12):2760.
https://doi.org/10.3390/ma18122760
Chicago/Turabian Style
Węgłowski, Rafał, Mateusz Mrukiewicz, Dorota Węgłowska, Malwina Liszewska, Bartosz Bartosewicz, Adrian Chlanda, and Anna Spadło.
2025. "Characterization of Modified DNA-Based Polymer Alignment Layers for Photonic Applications" Materials 18, no. 12: 2760.
https://doi.org/10.3390/ma18122760
APA Style
Węgłowski, R., Mrukiewicz, M., Węgłowska, D., Liszewska, M., Bartosewicz, B., Chlanda, A., & Spadło, A.
(2025). Characterization of Modified DNA-Based Polymer Alignment Layers for Photonic Applications. Materials, 18(12), 2760.
https://doi.org/10.3390/ma18122760