Lin, D.-Y.; Hsu, H.-P.; Wang, C.-W.; Chen, S.-W.; Shih, Y.-T.; Hwang, S.-B.; Sitarek, P.
Temperature-Dependent Absorption of Ternary HfS2−xSex 2D Layered Semiconductors. Materials 2022, 15, 6304.
https://doi.org/10.3390/ma15186304
AMA Style
Lin D-Y, Hsu H-P, Wang C-W, Chen S-W, Shih Y-T, Hwang S-B, Sitarek P.
Temperature-Dependent Absorption of Ternary HfS2−xSex 2D Layered Semiconductors. Materials. 2022; 15(18):6304.
https://doi.org/10.3390/ma15186304
Chicago/Turabian Style
Lin, Der-Yuh, Hung-Pin Hsu, Cheng-Wen Wang, Shang-Wei Chen, Yu-Tai Shih, Sheng-Beng Hwang, and Piotr Sitarek.
2022. "Temperature-Dependent Absorption of Ternary HfS2−xSex 2D Layered Semiconductors" Materials 15, no. 18: 6304.
https://doi.org/10.3390/ma15186304
APA Style
Lin, D.-Y., Hsu, H.-P., Wang, C.-W., Chen, S.-W., Shih, Y.-T., Hwang, S.-B., & Sitarek, P.
(2022). Temperature-Dependent Absorption of Ternary HfS2−xSex 2D Layered Semiconductors. Materials, 15(18), 6304.
https://doi.org/10.3390/ma15186304