Investigations of Structural and Electrical Properties of ALD Films Formed with the Ozone Precursor
Abstract
:1. Introduction
2. Materials and Methods
2.1. ALD of High-k Oxides
2.2. Structural Characterization of Dielectric Films
2.3. MIS Structures Fabrication and Electrical Characterization
3. Results and Discussion
3.1. Structural Characterization of Investigated Samples
3.2. Electrical Characterization of MIS Structures with ALD Films as Gate-Dielectric Layers
4. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Conflicts of Interest
References
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Sample | Csurface | Cbulk | Osurface | Obulk | Al(Hf)surface | Al(Hf)bulk | Zrsurface | Zrbulk |
---|---|---|---|---|---|---|---|---|
Al2O3 (H2O) | 14.2 | 4.9 | 48.5 | 53.7 | 37.3 Al/O = 0.77 | 41.4 Al/O = 0.77 | ||
Al2O3 (O3) | 20.5 | 4.8 | 46.8 | 54.9 | 32.7 Al/O = 0.70 | 40.3 Al/O = 0.73 | ||
Al2O3:Zr (H2O) | 18.6 | 4.5 | 46.8 | 52.7 | 33.3 Al/O = 0.71 | 40.6 Al/O = 0.77 | 1.3 | 2.2 |
Al2O3:Zr (O3) | 15.6 | 5.9 | 50.5 | 55.8 | 34.0 Al/O = 0.67 | 38.3 Al/O = 0.69 | 0 | |
HfO2 (O3) | 33.9 | 4.5 | 46.0 | 63.7 | 20.1 Hf/O = 0.44 | 31.8 Hf/O = 0.5 |
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Seweryn, A.; Lawniczak-Jablonska, K.; Kuzmiuk, P.; Gieraltowska, S.; Godlewski, M.; Mroczynski, R. Investigations of Structural and Electrical Properties of ALD Films Formed with the Ozone Precursor. Materials 2021, 14, 5395. https://doi.org/10.3390/ma14185395
Seweryn A, Lawniczak-Jablonska K, Kuzmiuk P, Gieraltowska S, Godlewski M, Mroczynski R. Investigations of Structural and Electrical Properties of ALD Films Formed with the Ozone Precursor. Materials. 2021; 14(18):5395. https://doi.org/10.3390/ma14185395
Chicago/Turabian StyleSeweryn, Aleksandra, Krystyna Lawniczak-Jablonska, Piotr Kuzmiuk, Sylwia Gieraltowska, Marek Godlewski, and Robert Mroczynski. 2021. "Investigations of Structural and Electrical Properties of ALD Films Formed with the Ozone Precursor" Materials 14, no. 18: 5395. https://doi.org/10.3390/ma14185395
APA StyleSeweryn, A., Lawniczak-Jablonska, K., Kuzmiuk, P., Gieraltowska, S., Godlewski, M., & Mroczynski, R. (2021). Investigations of Structural and Electrical Properties of ALD Films Formed with the Ozone Precursor. Materials, 14(18), 5395. https://doi.org/10.3390/ma14185395