Order Article Reprints

Kuchakova I, Ionita MD, Ionita E-R, Lazea-Stoyanova A, Brajnicov S, Mitu B, Dinescu G, De Vrieze M, Cvelbar U, Zille A, et al. Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets. Materials. 2020; 13(6):1296. https://doi.org/10.3390/ma13061296

Kuchakova, Iryna, Maria Daniela Ionita, Eusebiu-Rosini Ionita, Andrada Lazea-Stoyanova, Simona Brajnicov, Bogdana Mitu, Gheorghe Dinescu, Mike De Vrieze, Uroš Cvelbar, Andrea Zille, and et al. 2020. "Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets" Materials 13, no. 6: 1296. https://doi.org/10.3390/ma13061296

Kuchakova, I., Ionita, M. D., Ionita, E.-R., Lazea-Stoyanova, A., Brajnicov, S., Mitu, B., Dinescu, G., De Vrieze, M., Cvelbar, U., Zille, A., Leys, C., & Yu Nikiforov, A. (2020). Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets. Materials, 13(6), 1296. https://doi.org/10.3390/ma13061296