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Journal: Materials, 2020
Volume: 13
Number: 1296

Article: Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets
Authors: by Iryna Kuchakova, Maria Daniela Ionita, Eusebiu-Rosini Ionita, Andrada Lazea-Stoyanova, Simona Brajnicov, Bogdana Mitu, Gheorghe Dinescu, Mike De Vrieze, Uroš Cvelbar, Andrea Zille, Christophe Leys and Anton Yu Nikiforov
Link: https://www.mdpi.com/1996-1944/13/6/1296

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