Development of an Analytical Model for Optimization of Direct Laser Interference Patterning
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Institut für Fertigungstechnik, Technische Universität Dresden, George-Bähr-Str. 3c, 01069 Dresden, Germany
2
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS, Winterbergstr. 28, 01277 Dresden, Germany
*
Author to whom correspondence should be addressed.
Materials 2020, 13(1), 200; https://doi.org/10.3390/ma13010200
Received: 1 November 2019
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Revised: 12 December 2019
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Accepted: 18 December 2019
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Published: 3 January 2020
(This article belongs to the Special Issue Laser Materials Processing 2019)
Direct laser interference patterning (DLIP) has proven to be a fast and, at the same time, high-resolution process for the fabrication of large-area surface structures. In order to provide structures with adequate quality and defined morphology at the fastest possible fabrication speed, the processing parameters have to be carefully selected. In this work, an analytical model was developed and verified by experimental data, which allows calculating the morphological properties of periodic structures as a function of most relevant laser-processing parameters. The developed model permits to improve the process throughput by optimizing the laser spot diameter, as well as pulse energy, and repetition rate. The model was developed for the structures formed by a single scan of the beam in one direction. To validate the model, microstructures with a 5.5 µm spatial period were fabricated on stainless steel by means of picosecond DLIP (10 ps), using a laser source operating at a 1064 nm wavelength. The results showed a difference of only 10% compared to the experimental results.
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Keywords:
direct laser interference patterning; microstructures; process optimization; analytical model; laser ablation; stainless steel; line-like structure; microstructure
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MDPI and ACS Style
Voisiat, B.; Aguilar-Morales, A.I.; Kunze, T.; Lasagni, A.F. Development of an Analytical Model for Optimization of Direct Laser Interference Patterning. Materials 2020, 13, 200. https://doi.org/10.3390/ma13010200
AMA Style
Voisiat B, Aguilar-Morales AI, Kunze T, Lasagni AF. Development of an Analytical Model for Optimization of Direct Laser Interference Patterning. Materials. 2020; 13(1):200. https://doi.org/10.3390/ma13010200
Chicago/Turabian StyleVoisiat, Bogdan, Alfredo I. Aguilar-Morales, Tim Kunze, and Andrés F. Lasagni. 2020. "Development of an Analytical Model for Optimization of Direct Laser Interference Patterning" Materials 13, no. 1: 200. https://doi.org/10.3390/ma13010200
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