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Journal: Materials, 2018
Volume: 11
Number: 471
471
Article: Tuning of Schottky Barrier Height at NiSi/Si Contact by Combining Dual Implantation of Boron and Aluminum and Microwave Annealing
Authors: by Feng Sun, Chen Li, Chaochao Fu, Xiangbiao Zhou, Jun Luo, Wei Zou, Zhi-Jun Qiu and Dongping Wu
Link: https://www.mdpi.com/1996-1944/11/4/471

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