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Journal: Materials, 2017
Volume: 10
Number: 972

Article: A Simple Method for High-Performance, Solution-Processed, Amorphous ZrO2 Gate Insulator TFT with a High Concentration Precursor
Authors: by Wei Cai, Zhennan Zhu, Jinglin Wei, Zhiqiang Fang, Honglong Ning, Zeke Zheng, Shangxiong Zhou, Rihui Yao, Junbiao Peng and Xubing Lu
Link: https://www.mdpi.com/1996-1944/10/8/972

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