Next Article in Journal
Magnetic Material Assessment of a Novel Ultra-High Step-Up Converter with Single Semiconductor Switch and Galvanic Isolation for Fuel-Cell Power System
Next Article in Special Issue
Enhanced Activity of Au/NiO Nanohybrids for the Reductive Amination of Benzyl Alcohol
Previous Article in Journal
Modifying the Morphology of Silicon Surfaces by Laser Induced Liquid Assisted Colloidal Lithography
Article Menu
Issue 11 (November) cover image

Export Article

Open AccessArticle
Materials 2017, 10(11), 1309; https://doi.org/10.3390/ma10111309

An Investigation of Polyoxometalate Hybrid Materials as Patternable Dielectrics and Lithographic Resists

Department of Chemical and Materials Engineering, University of Idaho, Moscow, ID 83844, USA
*
Author to whom correspondence should be addressed.
Received: 1 November 2017 / Revised: 8 November 2017 / Accepted: 9 November 2017 / Published: 15 November 2017
(This article belongs to the Special Issue Polyoxometalate and Nanohybrid Materials)
Full-Text   |   PDF [6041 KB, uploaded 15 November 2017]   |  

Abstract

Polyoxometalate (POM) hybrid materials have shown potential as spin-coatable, patternable dielectric thin-films and components for lithographic resists. In particular, the octamolybdate cluster has been shown to possess good spin-coating properties and the patterning capabilities of hybrid octamolybdate thin-films were explored using a combination of broadband UV and electron beam lithography (EBL) techiniques. Dielectric properties of these films were determined by ellipsometry, and octamolybdate clusters were subsequently investigated as negative resists in various blends for potential uses in next-generation photolithography, where contrast, sensitivity, and line edge roughness characteristics were determined. Preliminary evidence for the suppression of the diffusion of photo-generated acids is presented. View Full-Text
Keywords: polyoxometalate; hybrid materials; dielectrics; photolithography polyoxometalate; hybrid materials; dielectrics; photolithography
Figures

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
SciFeed

Share & Cite This Article

MDPI and ACS Style

Hardie, B.; Roll, M. An Investigation of Polyoxometalate Hybrid Materials as Patternable Dielectrics and Lithographic Resists. Materials 2017, 10, 1309.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics

1

Comments

[Return to top]
Materials EISSN 1996-1944 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top