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Open AccessArticle

An Investigation of Polyoxometalate Hybrid Materials as Patternable Dielectrics and Lithographic Resists

Department of Chemical and Materials Engineering, University of Idaho, Moscow, ID 83844, USA
Author to whom correspondence should be addressed.
Materials 2017, 10(11), 1309;
Received: 1 November 2017 / Revised: 8 November 2017 / Accepted: 9 November 2017 / Published: 15 November 2017
(This article belongs to the Special Issue Polyoxometalate and Nanohybrid Materials)
Polyoxometalate (POM) hybrid materials have shown potential as spin-coatable, patternable dielectric thin-films and components for lithographic resists. In particular, the octamolybdate cluster has been shown to possess good spin-coating properties and the patterning capabilities of hybrid octamolybdate thin-films were explored using a combination of broadband UV and electron beam lithography (EBL) techiniques. Dielectric properties of these films were determined by ellipsometry, and octamolybdate clusters were subsequently investigated as negative resists in various blends for potential uses in next-generation photolithography, where contrast, sensitivity, and line edge roughness characteristics were determined. Preliminary evidence for the suppression of the diffusion of photo-generated acids is presented. View Full-Text
Keywords: polyoxometalate; hybrid materials; dielectrics; photolithography polyoxometalate; hybrid materials; dielectrics; photolithography
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Hardie, B.; Roll, M. An Investigation of Polyoxometalate Hybrid Materials as Patternable Dielectrics and Lithographic Resists. Materials 2017, 10, 1309.

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