Improvement of the Thermoelectric Properties in the FeSi2 Semiconductor Through Cu and Al Doping
Abstract
1. Introduction
2. Materials and Methods
2.1. Sample Preparation Procedure
2.2. Characterization
3. Results and Discussion
3.1. Characterization of Undoped FeSi2
3.2. Effects of Cu Doping on FeSi2
3.3. Effects of Al Doping on FeSi2
4. Conclusions
Funding
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
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Saito, T. Improvement of the Thermoelectric Properties in the FeSi2 Semiconductor Through Cu and Al Doping. Energies 2026, 19, 2997. https://doi.org/10.3390/en19132997
Saito T. Improvement of the Thermoelectric Properties in the FeSi2 Semiconductor Through Cu and Al Doping. Energies. 2026; 19(13):2997. https://doi.org/10.3390/en19132997
Chicago/Turabian StyleSaito, Tetsuji. 2026. "Improvement of the Thermoelectric Properties in the FeSi2 Semiconductor Through Cu and Al Doping" Energies 19, no. 13: 2997. https://doi.org/10.3390/en19132997
APA StyleSaito, T. (2026). Improvement of the Thermoelectric Properties in the FeSi2 Semiconductor Through Cu and Al Doping. Energies, 19(13), 2997. https://doi.org/10.3390/en19132997

