Design and Performance of a Pinned Photodiode CMOS Image Sensor Using Reverse Substrate Bias†
AbstractA new pinned photodiode (PPD) CMOS image sensor with reverse biased p-type substrate has been developed and characterized. The sensor uses traditional PPDs with one additional deep implantation step to suppress the parasitic reverse currents, and can be fully depleted. The first prototypes have been manufactured on an 18 µm thick, 1000 Ω·cm epitaxial silicon wafers using 180 nm PPD image sensor process. Both front-side illuminated (FSI) and back-side illuminated (BSI) devices were manufactured in collaboration with Teledyne e2v. The characterization results from a number of arrays of 10 µm and 5.4 µm PPD pixels, with different shape, the size and the depth of the new implant are in good agreement with device simulations. The new pixels could be reverse-biased without parasitic leakage currents well beyond full depletion, and demonstrate nearly identical optical response to the reference non-modified pixels. The observed excessive charge sharing in some pixel variants is shown to not be a limiting factor in operation. This development promises to realize monolithic PPD CIS with large depleted thickness and correspondingly high quantum efficiency at near-infrared and soft X-ray wavelengths. View Full-Text
Share & Cite This Article
Stefanov, K.D.; Clarke, A.S.; Ivory, J.; Holland, A.D. Design and Performance of a Pinned Photodiode CMOS Image Sensor Using Reverse Substrate Bias. Sensors 2018, 18, 118.
Stefanov KD, Clarke AS, Ivory J, Holland AD. Design and Performance of a Pinned Photodiode CMOS Image Sensor Using Reverse Substrate Bias. Sensors. 2018; 18(1):118.Chicago/Turabian Style
Stefanov, Konstantin D.; Clarke, Andrew S.; Ivory, James; Holland, Andrew D. 2018. "Design and Performance of a Pinned Photodiode CMOS Image Sensor Using Reverse Substrate Bias." Sensors 18, no. 1: 118.
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.