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Takahashi S, Huang Y-M, Sze J-J, Wu T-T, Guo F-S, Hsu W-C, Tseng T-H, Liao K, Kuo C-C, Chen T-H, et al. A 45 nm Stacked CMOS Image Sensor Process Technology for Submicron Pixel. Sensors. 2017; 17(12):2816. https://doi.org/10.3390/s17122816

Takahashi, Seiji, Yi-Min Huang, Jhy-Jyi Sze, Tung-Ting Wu, Fu-Sheng Guo, Wei-Cheng Hsu, Tung-Hsiung Tseng, King Liao, Chin-Chia Kuo, Tzu-Hsiang Chen, and et al. 2017. "A 45 nm Stacked CMOS Image Sensor Process Technology for Submicron Pixel" Sensors 17, no. 12: 2816. https://doi.org/10.3390/s17122816

Takahashi, S., Huang, Y.-M., Sze, J.-J., Wu, T.-T., Guo, F.-S., Hsu, W.-C., Tseng, T.-H., Liao, K., Kuo, C.-C., Chen, T.-H., Chiang, W.-C., Chuang, C.-H., Chou, K.-Y., Chung, C.-H., Chou, K.-Y., Tseng, C.-H., Wang, C.-J., & Yaung, D.-N. (2017). A 45 nm Stacked CMOS Image Sensor Process Technology for Submicron Pixel. Sensors, 17(12), 2816. https://doi.org/10.3390/s17122816