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Keywords = reactive co-sputtering

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23 pages, 4807 KB  
Article
Reactive Magnetron-Sputtered Tantalum–Copper Nitride Coatings: Structure, Electrical Anisotropy, and Antibacterial Behavior
by Paweł Żukowski, Vitalii Bondariev, Anatoliy I. Kupchishin, Marat N. Niyazov, Kairat B. Tlebaev, Yaroslav Bobitski, Joanna Kisała, Joanna Wojtas, Anna Żaczek, Štefan Hardoň and Alexander D. Pogrebnjak
Nanomaterials 2025, 15(23), 1813; https://doi.org/10.3390/nano15231813 - 30 Nov 2025
Viewed by 549
Abstract
Tantalum nitride (TaN) coatings are valued for their hardness, chemical inertness, and biocompatibility; however, they lack intrinsic antibacterial properties, which limits their application in biomedical environments. Introducing copper (Cu) into the TaN matrix offers a potential solution by combining TaN’s mechanical and chemical [...] Read more.
Tantalum nitride (TaN) coatings are valued for their hardness, chemical inertness, and biocompatibility; however, they lack intrinsic antibacterial properties, which limits their application in biomedical environments. Introducing copper (Cu) into the TaN matrix offers a potential solution by combining TaN’s mechanical and chemical durability with Cu’s well-documented antimicrobial action. This study explores how varying copper incorporation affects the structural, electrical, photocatalytic, and antibacterial characteristics of TaCuN multilayer films synthesized via reactive magnetron sputtering. Three thin TaCuN films were fabricated using a high-power reactive magnetron co-sputtering system, varying the Cu target power to control the composition. Structural and morphological analysis was performed using X-ray diffraction (XRD), scanning/transmission electron microscopy (STEM/TEM), and energy-dispersive X-ray spectroscopy (EDS). Electrical conductivity was studied along and across the film surfaces at temperatures ranging from 20 to 375 K using AC impedance spectroscopy. Optical and photocatalytic properties were assessed using UV–Vis spectroscopy and methylene blue degradation tests. Antibacterial activity against Staphylococcus aureus was analyzed under visible light using CFU reduction tests. XRD and TEM analyses revealed a multilayered four-zone architecture with alternating Ta-, Cu-, and N-rich phases and a dominant cubic δ-TaN pattern. The layers exhibited pronounced conductivity anisotropy, with in-plane conductivity (~103 Ω−1 cm−1) exceeding cross-plane conductivity by ~107 times, attributed to the formation of a metallic conduction channel in the mid-layer. Optical spectra indicated limited light absorption above 300 nm and negligible photocatalytic activity. Increasing the Cu content substantially enhanced antibacterial efficiency, with the highest-Cu sample achieving 95.6 % bacterial growth reduction. Morphological evaluation indicated that smooth film surfaces (Ra < 0.2 μm) effectively minimized bacterial adhesion. Reactive magnetron sputtering enables the precise engineering of TaCuN multilayers, combining high electrical anisotropy with robust antibacterial functionality. The optimized TaCuN coating offers promising potential in biomedical and protective applications where both conductivity and microbial resistance are required. Full article
(This article belongs to the Special Issue Synthesis of Functional Nanoparticles for Biomedical Applications)
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18 pages, 9390 KB  
Article
Effects of TaN Cap Layer on the Tribological and Antibacterial Properties of TaN-(Ag,Cu) Nanocomposite Thin Films
by Jang Hsing Hsieh, Anwesha Dey, Chuan Li and You Jen Cho
Coatings 2025, 15(10), 1175; https://doi.org/10.3390/coatings15101175 - 8 Oct 2025
Viewed by 555
Abstract
Reactive co-sputtering was applied to deposit TaN-(Ag,Cu) nanocomposite films on Si and tool steels. Prior to post-deposition annealing, the films were deposited with TaN cap (diffusion barrier) layers in various thicknesses in order to slow down the nucleation and growth of emerging Ag [...] Read more.
Reactive co-sputtering was applied to deposit TaN-(Ag,Cu) nanocomposite films on Si and tool steels. Prior to post-deposition annealing, the films were deposited with TaN cap (diffusion barrier) layers in various thicknesses in order to slow down the nucleation and growth of emerging Ag and Cu particles. The thickness of the cap layers was set at 5, 10, 20, or 50 nm. The films were then annealed using Rapid Thermal Annealing (RTA) at 400 °C to induce the nucleation and growth of Ag and Cu nanoparticles. These films’ surface morphologies and structures were examined. The samples were tested for their anti-wear and antibacterial behaviors against Gram-positive S. aureus and Gram-negative E. coli, with a variation in cap layer thickness. It is found that, through the application of TaN cap layers, the out-diffusion of Ag and Cu atoms may be slowed down. The surface concentrations of Ag and Cu might decrease from 35 at.% and 17 at.% to 18 at.% and 6 at.%, respectively, when the cap layer thickness increases to 50 nm (after being annealed for 12 min). The diffusion mechanism is proposed to explain the formation of nanoparticles on the surface through boundary diffusion. Antibacterial behaviors against both bacteria, as well as tribological properties, could still be effective but become less significant with an increase in the cap layer thickness. The antibacterial efficiency after 3 h testing decreased from 99% to 5% and 8% against E. coli and S. aureus, respectively. At 12 h, all the samples reached >99% antibacterial efficiency, despite the variation in cap thickness. For sliding wear, the wear rate was doubled when the cap thickness increased to 50 nm (when the normal load was 1 N). On the other hand, the difference was minor when the normal load was changed to 5 N. The sliding lifetime of the samples was studied using a tribometer. The total lifetime may increase with an increase in the cap thickness. The wear is found to be due to the oxidation of Ag and Cu nanoparticles, which results in the loss of low coefficient behaviors. Full article
(This article belongs to the Special Issue Advanced Thin Film Fabrication by Sputtering)
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17 pages, 4404 KB  
Proceeding Paper
Surface Roughness and Fractal Analysis of TiO2 Thin Films by DC Sputtering
by Helena Cristina Vasconcelos, Telmo Eleutério and Maria Meirelles
Eng. Proc. 2025, 105(1), 2; https://doi.org/10.3390/engproc2025105002 - 4 Aug 2025
Viewed by 795
Abstract
This study examines the effect of oxygen concentration and sputtering power on the surface morphology of TiO2 thin films deposited by DC reactive magnetron sputtering. Surface roughness parameters were obtained using MountainsMap® software(10.2) from SEM images, while fractal dimensions and texture [...] Read more.
This study examines the effect of oxygen concentration and sputtering power on the surface morphology of TiO2 thin films deposited by DC reactive magnetron sputtering. Surface roughness parameters were obtained using MountainsMap® software(10.2) from SEM images, while fractal dimensions and texture descriptors were extracted via Python-based image processing. Fractal dimension was calculated using the box-counting method applied to binarized images with multiple threshold levels, and texture analysis employed Gray-Level Co-occurrence Matrix (GLCM) statistics to capture local anisotropies and spatial heterogeneity. Four samples were analyzed, previously prepared with oxygen concentrations of 50% and 75%, and sputtering powers of 500 W and 1000 W. The results have shown that films deposited at higher oxygen levels and sputtering powers exhibited increased roughness, higher fractal dimensions, and stronger GLCM contrast, indicating more complex and heterogeneous surface structures. Conversely, films produced at lower oxygen and power settings showed smoother, more isotropic surfaces with lower complexity. This integrated analysis framework links deposition parameters with morphological characteristics, enhancing the understanding of surface evolution and enabling better control of TiO2 thin film properties. Full article
(This article belongs to the Proceedings of The 4th Coatings and Interfaces Online Conference)
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17 pages, 3659 KB  
Article
Tribological Performance of TiN–WS2 Soft–Hard Multifunctional Composite Coatings Deposited by Magnetron Sputtering
by Hu Qiao, Shengchao Zhu, Suixin Fan, Jiawei Kang, Peichao Tian, Jianxin Yang and Youqing Wang
Coatings 2025, 15(5), 596; https://doi.org/10.3390/coatings15050596 - 17 May 2025
Cited by 1 | Viewed by 1754
Abstract
Titanium nitride (TiN) is a widely used industrial hard coating material, known for its excellent hardness and chemical stability. However, its relatively high coefficient of friction (COF) often leads to interfacial heat accumulation and adhesive wear during service, limiting its applicability in high-temperature [...] Read more.
Titanium nitride (TiN) is a widely used industrial hard coating material, known for its excellent hardness and chemical stability. However, its relatively high coefficient of friction (COF) often leads to interfacial heat accumulation and adhesive wear during service, limiting its applicability in high-temperature tribological environments. To enhance its tribological performance, a TiN–WS2 soft–hard composite coating was fabricated on cemented carbide substrates using reactive co-sputtering magnetron deposition. By adjusting the sputtering parameters and target power ratio, a synergistic deposition of the hard (TiN) and lubricating (WS2) phases was achieved and compared with a pure TiN coating. The results revealed that the incorporation of WS2 significantly reduced the COF at both room temperature (25 °C) and an elevated temperature (200 °C), with the average values decreasing from 0.61 to 0.39 at 25 °C and from 0.53 to 0.36 at 200 °C. A white light interferometry analysis showed that the TiN–WS2 coating exhibited narrower wear tracks and less surface damage than TiN at elevated temperatures, demonstrating superior friction-reducing and wear-resistant capabilities. In terms of mechanical properties, the composite coating showed a reduction in the hardness, the reduced elastic modulus (Er), and the adhesion strength by 27.3%, 19.8%, and 9.5%, respectively, compared to pure TiN. These findings indicate that the introduction of a quantitatively controlled lubricating WS2 phase allows for a balance between nanoscale hardness and wear resistance, offering promising potential for engineering applications under complex working conditions. Full article
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28 pages, 31225 KB  
Article
Achieving Superlubricity: Development of Multilayer Co-Doped DLC Coatings and Tribological Evaluation with Eco-Friendly Base Oil and Low-SAPS Oil Formulations
by Mobeen Haneef, Manuel Evaristo, Liuquan Yang, Ardian Morina and Bruno Trindade
Materials 2025, 18(4), 847; https://doi.org/10.3390/ma18040847 - 14 Feb 2025
Cited by 1 | Viewed by 1328
Abstract
To address modern tribological challenges—reducing friction and wear to conserve resources while minimising environmental impact—cobalt-doped DLC (Co-DLC) coatings were developed. These nanometric multilayer coatings, designed to retain key properties such as hardness, reduced modulus, and substrate adhesion, were fabricated using non-reactive DC magnetron [...] Read more.
To address modern tribological challenges—reducing friction and wear to conserve resources while minimising environmental impact—cobalt-doped DLC (Co-DLC) coatings were developed. These nanometric multilayer coatings, designed to retain key properties such as hardness, reduced modulus, and substrate adhesion, were fabricated using non-reactive DC magnetron sputtering (DCMS). The multilayer structure was achieved by controlling the planetary substrate holder’s rotational speed. Characterisation of microscopic, chemical, structural, and mechanical properties was performed using techniques including FEI-SEM, EDS, XRD, TEM, Raman spectroscopy, scratch adhesion testing, and nanoindentation. Tribological performance was evaluated under boundary and fully flooded lubrication using PAO4 base oil and formulations with ashless, sulphur-free AW and EP additives. The coatings exhibited a granular surface morphology, columnar cross-sections, and amorphous structure. Increased dopant concentrations slightly enhanced graphitisation and significantly improved adhesion, though hardness and reduced modulus decreased. Tribological testing revealed superlubricity in several coating–oil combinations and significantly reduced wear rates with higher dopant levels and new additives. A phosphate ester additive without an amine group achieved the lowest COF values, while one with an amine group yielded minimal wear rates. These findings highlight the potential of Co-DLC coatings and tailored additives to minimise friction and wear effectively. Full article
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17 pages, 1931 KB  
Article
Lithium Tracer Diffusion in LixCoO2 and LixNi1/3Mn1/3Co1/3O2 (x = 1, 0.9, 0.65)-Sintered Bulk Cathode Materials for Lithium-Ion Batteries
by Erwin Hüger, Daniel Uxa and Harald Schmidt
Batteries 2025, 11(2), 40; https://doi.org/10.3390/batteries11020040 - 21 Jan 2025
Cited by 1 | Viewed by 1990
Abstract
The knowledge of Li diffusivities in electrode materials of Li-ion batteries (LIBs) is essential for a fundamental understanding of charging/discharging times, maximum capacities, stress formation and possible side reactions. The literature indicates that Li diffusion in the cathode material Li(Ni,Mn,Co)O2 strongly increases [...] Read more.
The knowledge of Li diffusivities in electrode materials of Li-ion batteries (LIBs) is essential for a fundamental understanding of charging/discharging times, maximum capacities, stress formation and possible side reactions. The literature indicates that Li diffusion in the cathode material Li(Ni,Mn,Co)O2 strongly increases during electrochemical delithiation. Such an increased Li diffusivity will be advantageous for performance if it is present already in the initial state after synthesis. In order to understand the influence of a varying initial Li content on Li diffusion, we performed Li tracer diffusion experiments on LixCoO2 (LCO) and LixNi1/3Mn1/3Co1/3O2 (NMC, x = 1, 0.9, 0.65) cathode materials. The measurements were performed on polycrystalline sintered bulk materials, free of additives and binders, in order to study the intrinsic properties. The variation of Li content was achieved using reactive solid-state synthesis using pressed Li2CO3, NiO, Co3O4 and/or MnO2 powders and high temperature sintering at 800 °C. XRD analyses showed that the resultant bulk samples exhibit the layered LCO or NMC phases with a low amount of cation intermixing. Moreover, the presence of additional NiO and Co3O4 phases was detected in NMC with a pronounced nominal Li deficiency of x = 0.65. As a tracer source, a 6Li tracer layer with the same chemical composition was deposited using ion beam sputtering. Secondary ion mass spectrometry in depth profile mode was used for isotopic analysis. The diffusivities followed the Arrhenius law with an activation enthalpy of about 0.8 eV and were nearly identical within error for all samples investigated in the temperature range up to 500 °C. For a diffusion mechanism based on structural Li vacancies, the results indicated that varying the Li content does not result in a change in the vacancy concentration. Consequently, the design and use of a cathode initially made of a Li-deficient material will not improve the kinetics of battery performance. The possible reasons for this unexpected result are discussed. Full article
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17 pages, 2089 KB  
Article
BiVO4-Based Systems Magnetron Sputtered with Silver Nanoparticles for the Artificial Photosynthesis Reaction
by Eva Naughton, Emerson C. Kohlrausch, Jesum Alves Fernandes and James A. Sullivan
Sustain. Chem. 2025, 6(1), 4; https://doi.org/10.3390/suschem6010004 - 17 Jan 2025
Cited by 3 | Viewed by 2583
Abstract
The incorporation of Ag nanoparticles onto BiVO4 (a known H2O oxidising photocatalyst) through magnetron sputtering to form a composite was studied. ICP-OES results showed that the loading of Ag on BiVO4 was below 1% in all cases. UV-Vis DRS [...] Read more.
The incorporation of Ag nanoparticles onto BiVO4 (a known H2O oxidising photocatalyst) through magnetron sputtering to form a composite was studied. ICP-OES results showed that the loading of Ag on BiVO4 was below 1% in all cases. UV-Vis DRS and CO2-TPD analyses demonstrated that upon incorporation of Ag onto BiVO4, an increase in the extent of visible light absorption and CO2 adsorption was seen. TEM imaging showed the presence of Ag particles on the surface of larger BiVO4 particles, while XRD analysis provided evidence for some doping of Ag into BiVO4 lattices. The effect of the composite formation on the activity of the materials in the artificial photosynthesis reaction was significant. BiVO4 alone produces negligible amounts of gaseous products. However, the Ag-sputtered composites produce both CO and CH4, with a higher loading of Ag leading to higher levels of product formation. This reactivity is ascribed to the generation of a heterojunction in the composite material. It is suggested that the generation of holes in BiVO4 following photon absorption is used to provide protons (from H2O oxidation), and the decay of an SPR response on the Ag NPs provides hot electrons, which together with the protons reduce CO2 to produce CH4, CO, and adsorbed hydrocarbonaceous species. Full article
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16 pages, 12195 KB  
Article
Microstructure and Mechanical Behavior of Magnetron Co-Sputtering MoTaN Coatings
by Jia-Yi Hsu and Fan-Bean Wu
Coatings 2025, 15(1), 80; https://doi.org/10.3390/coatings15010080 - 13 Jan 2025
Viewed by 1149
Abstract
In recent years, there have been important developments in the refractory metal nitride coatings used for versatile applications, such as MoN, TaN, NbN, etc. Engineered approaches, including the deposition method, microstructure control, structural design, and the addition of functional elements, are put into [...] Read more.
In recent years, there have been important developments in the refractory metal nitride coatings used for versatile applications, such as MoN, TaN, NbN, etc. Engineered approaches, including the deposition method, microstructure control, structural design, and the addition of functional elements, are put into practice for the promotion of coating characteristics. This study focuses on the microstructure and mechanical properties of ternary molybdenum tantalum nitride, MoTaN, coatings. MoTaN was deposited using a reactive radio frequency (r.f.) magnetron co-sputtering system with Mo/Ta target input power modulation control. The effects of composition and microstructure variations on its mechanical properties, including its hardness, elastic modulus, and wear behavior, were investigated. In general, the MoTaN coatings exhibited a columnar polycrystalline microstructure with MoN(111), Mo2N(111), Mo2N(200), TaN(200), and TaN(220) phases and orientations based on X-ray diffraction analysis. The addition of Ta triggered the transition of the primary orientation of Mo2N(111) into Mo2N(200). Transmission electron microscopy was utilized to analyze the transformation of the multiphase structure and changes in the grain size in terms of the Ta addition. According to nanoindentation and wear resistance analyses, superior hardness, elastic modulus, H/E, H3/E2, and wear-resistance values were identified for the MoTaN coatings with 6.8 to 10.4 at.% Ta, and a maximum hardness of 18.0 GPa was found for the MoTaN coating deposited at an input power of Mo/Ta = 150/100 W/W. An optimized hardness of 18.0 GPa and an elastic modulus of 220.7 GPa were obtained. The adjustment of the input power during deposition played a critical role in determining the overall performance of the MoTaN co-sputtering coatings. The MoTaN coating with optimized mechanical properties is attributed to its multiphase microstructure and fine columnar grain size of less than 30 nm. Full article
(This article belongs to the Special Issue Sputtering Deposition for Advanced Materials and Interfaces)
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17 pages, 9752 KB  
Article
Impact of Silver Incorporation and Flash-Lamp-Annealing on the Photocatalytic Response of Sputtered ZnO Films
by Leo Álvarez-Fraga, Raúl Gago, David G. Calatayud, Slawomir Prucnal and Olga Sánchez
Nanomaterials 2024, 14(18), 1519; https://doi.org/10.3390/nano14181519 - 19 Sep 2024
Cited by 1 | Viewed by 1688
Abstract
Thin films of silver-doped zinc oxide (SZO) were deposited at room temperature using a DC reactive magnetron co-sputtering technique using two independent Zn and Ag targets. The crystallographic structure, chemical composition and surface morphology of SZO films with different silver concentrations were correlated [...] Read more.
Thin films of silver-doped zinc oxide (SZO) were deposited at room temperature using a DC reactive magnetron co-sputtering technique using two independent Zn and Ag targets. The crystallographic structure, chemical composition and surface morphology of SZO films with different silver concentrations were correlated with the photocatalytic (PC) properties. The crystallization of the SZO films was made using millisecond range flash-lamp-annealing (FLA) treatments. FLA induces significant structural ordering of the wurtzite structure and an in-depth redistribution of silver, resulting in the formation of silver agglomerates. The wurtzite ZnO structure is observed for silver contents below 10 at.% where Ag is partially incorporated into the oxide matrix, inducing a decrease in the optical band-gap. Regardless of the silver content, all the as-grown SZO films do not exhibit any significant PC activity. The best PC response is achieved for samples with a relatively low Ag content (2–5 at.%) after FLA treatment. The enhanced PC activity of SZO upon FLA can be attributed to structural ordering and the effective band-gap narrowing through the combination of silver doping and the plasmonic effect caused by the formation of Ag clusters. Full article
(This article belongs to the Special Issue Synthesis and Properties of Metal Oxide Thin Films)
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11 pages, 3160 KB  
Article
Ferroelectric and Structural Properties of Cobalt-Doped Lead Ferrite Thin Films Formed by Reactive Magnetron Sputtering
by Benas Beklešovas, Vytautas Stankus, Aleksandras Iljinas and Liutauras Marcinauskas
Crystals 2024, 14(8), 721; https://doi.org/10.3390/cryst14080721 - 12 Aug 2024
Cited by 2 | Viewed by 1220
Abstract
Cobalt-doped lead ferrite (Pb2Fe2O5) thin films were deposited by reactive magnetron sputtering. The influence of the cobalt concentration and synthesis temperature on the structure, phase composition and ferroelectric properties of Pb2Fe2O5 thin [...] Read more.
Cobalt-doped lead ferrite (Pb2Fe2O5) thin films were deposited by reactive magnetron sputtering. The influence of the cobalt concentration and synthesis temperature on the structure, phase composition and ferroelectric properties of Pb2Fe2O5 thin films was investigated. It was determined that the increase in deposition temperature increased the grain size and density of the Co-doped PFO thin films. The XRD data demonstrated that the Co-doped Pb2Fe2O5 thin films consisted of Pb2Fe2O5 and PbO phases with a low amount of CoO and Co3O4 phases. The increase in the cobalt concentration in the Pb2Fe2O5 films slightly enhanced the cobalt oxide phase content. Polarization dependence on electric field measurement demonstrated that the highest ferroelectric properties of the Co-doped Pb2Fe2O5 films were obtained when the synthesis was performed at 550 °C temperatures. The increase in the cobalt concentration in the films enhanced the remnant polarization and coercive field values. It was found that the Co-doped Pb2Fe2O5 film deposited at 550 °C temperature and containing 10% cobalt had the highest remnant polarization (72 µC/cm2) and coercive electric field (105 kV/cm). Full article
(This article belongs to the Special Issue Magnetoelectric Materials and Their Application)
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14 pages, 3247 KB  
Article
Long Electrical Stability on Dual Acceptor p-Type ZnO:Ag,N Thin Films
by Fernando Avelar-Muñoz, Roberto Gómez-Rosales, Arturo Agustín Ortiz-Hernández, Héctor Durán-Muñoz, Javier Alejandro Berumen-Torres, Jorge Alberto Vagas-Téllez, Hugo Tototzintle-Huitle, Víctor Hugo Méndez-García, José de Jesús Araiza and José Juan Ortega-Sigala
Micromachines 2024, 15(6), 800; https://doi.org/10.3390/mi15060800 - 18 Jun 2024
Viewed by 2666
Abstract
p-type Ag-N dual acceptor doped ZnO thin films with long electrical stability were deposited by DC magnetron reactive co-sputtering technique. After deposition, the films were annealed at 400 °C for one hour in a nitrogen-controlled atmosphere. The deposited films were amorphous. However, after [...] Read more.
p-type Ag-N dual acceptor doped ZnO thin films with long electrical stability were deposited by DC magnetron reactive co-sputtering technique. After deposition, the films were annealed at 400 °C for one hour in a nitrogen-controlled atmosphere. The deposited films were amorphous. However, after annealing, they crystallize in the typical hexagonal wurtzite structure of ZnO. The Ag-N dual acceptors were incorporated substitutionally in the structure of zinc oxide, and achieving that; the three samples presented the p-type conductivity in the ZnO. Initial electrical properties showed a low resistivity of from 1 to 10−3 Ω·cm, Hall mobility of tens cm2/V·s, and a hole concentration from 1017 to 1019 cm−3. The electrical stability analysis reveals that the p-type conductivity of the ZnO:Ag,N films is very stable and does not revert to n-type, even after 36 months of aging. These results reveal the feasibility of using these films for applications in short-wavelength or transparent optoelectronic devices. Full article
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17 pages, 5246 KB  
Article
Nanoimprint Lithography for Next-Generation Carbon Nanotube-Based Devices
by Svitlana Fialkova, Sergey Yarmolenko, Arvind Krishnaswamy, Jagannathan Sankar, Vesselin Shanov, Mark J. Schulz and Salil Desai
Nanomaterials 2024, 14(12), 1011; https://doi.org/10.3390/nano14121011 - 11 Jun 2024
Cited by 8 | Viewed by 3927
Abstract
This research reports the development of 3D carbon nanostructures that can provide unique capabilities for manufacturing carbon nanotube (CNT) electronic components, electrochemical probes, biosensors, and tissue scaffolds. The shaped CNT arrays were grown on patterned catalytic substrate by chemical vapor deposition (CVD) method. [...] Read more.
This research reports the development of 3D carbon nanostructures that can provide unique capabilities for manufacturing carbon nanotube (CNT) electronic components, electrochemical probes, biosensors, and tissue scaffolds. The shaped CNT arrays were grown on patterned catalytic substrate by chemical vapor deposition (CVD) method. The new fabrication process for catalyst patterning based on combination of nanoimprint lithography (NIL), magnetron sputtering, and reactive etching techniques was studied. The optimal process parameters for each technique were evaluated. The catalyst was made by deposition of Fe and Co nanoparticles over an alumina support layer on a Si/SiO2 substrate. The metal particles were deposited using direct current (DC) magnetron sputtering technique, with a particle ranging from 6 nm to 12 nm and density from 70 to 1000 particles/micron. The Alumina layer was deposited by radio frequency (RF) and reactive pulsed DC sputtering, and the effect of sputtering parameters on surface roughness was studied. The pattern was developed by thermal NIL using Si master-molds with PMMA and NRX1025 polymers as thermal resists. Catalyst patterns of lines, dots, and holes ranging from 70 nm to 500 nm were produced and characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Vertically aligned CNTs were successfully grown on patterned catalyst and their quality was evaluated by SEM and micro-Raman. The results confirm that the new fabrication process has the ability to control the size and shape of CNT arrays with superior quality. Full article
(This article belongs to the Section 2D and Carbon Nanomaterials)
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16 pages, 5749 KB  
Article
Reactive Magnetron Sputtering for Y-Doped Barium Zirconate Electrolyte Deposition in a Complete Protonic Ceramic Fuel Cell
by Victoire Lescure, Mélanie François, Maëlys Charleux, Eric Aubry, Lionel Combemale, Pascal Briois and Gilles Caboche
Crystals 2024, 14(5), 475; https://doi.org/10.3390/cryst14050475 - 18 May 2024
Cited by 3 | Viewed by 1909
Abstract
Yttrium-doped barium zirconate is a commonly used electrolyte material for Protonic Ceramic Fuel Cells (PCFC) due to its high protonic conductivity and high chemical stability. However, it is also known for its poor sinterability and poor grain boundary conductivity. In this work, in [...] Read more.
Yttrium-doped barium zirconate is a commonly used electrolyte material for Protonic Ceramic Fuel Cells (PCFC) due to its high protonic conductivity and high chemical stability. However, it is also known for its poor sinterability and poor grain boundary conductivity. In this work, in response to these issues, reactive magnetron sputtering was strategically chosen as the electrolyte deposition technique. This method allows the creation of a 4 µm tick electrolyte with a dense columnar microstructure. Notably, this technique is not widely utilized in PCFC fabrication. In this study, a complete cell is elaborated without exceeding a sintering temperature of 1350 °C. Tape casting is used for the anode, and spray coating is used for the cathode. The material of interest is yttrium-doped barium zirconate with the formula BaZr0.8Y0.2O3−δ (BZY). The anode consists of a NiO-BZY cermet, while the cathode is composed of BZY and Ba0.5Sr0.5Co0.8Fe0.2O3−δ (BSFC) in a 50:50 weight ratio. The electrochemical impedance spectroscopy analysis reveals a global polarization resistance of 0.3 Ω cm2, indicating highly efficient interfaces between electrolytes and electrodes. Full article
(This article belongs to the Section Materials for Energy Applications)
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17 pages, 5623 KB  
Article
Nanocrystalline Cubic Phase Scandium-Stabilized Zirconia Thin Films
by Victor Danchuk, Mykola Shatalov, Michael Zinigrad, Alexey Kossenko, Tamara Brider, Luc Le, Dustin Johnson, Yuri M. Strzhemechny and Albina Musin
Nanomaterials 2024, 14(8), 708; https://doi.org/10.3390/nano14080708 - 18 Apr 2024
Cited by 6 | Viewed by 2212
Abstract
The cubic zirconia (ZrO2) is attractive for a broad range of applications. However, at room temperature, the cubic phase needs to be stabilized. The most studied stabilization method is the addition of the oxides of trivalent metals, such as Sc2 [...] Read more.
The cubic zirconia (ZrO2) is attractive for a broad range of applications. However, at room temperature, the cubic phase needs to be stabilized. The most studied stabilization method is the addition of the oxides of trivalent metals, such as Sc2O3. Another method is the stabilization of the cubic phase in nanostructures—nanopowders or nanocrystallites of pure zirconia. We studied the relationship between the size factor and the dopant concentration range for the formation and stabilization of the cubic phase in scandium-stabilized zirconia (ScSZ) films. The thin films of (ZrO2)1−x(Sc2O3)x, with x from 0 to 0.2, were deposited on room-temperature substrates by reactive direct current magnetron co-sputtering. The crystal structure of films with an average crystallite size of 85 Å was cubic at Sc2O3 content from 6.5 to 17.5 mol%, which is much broader than the range of 8–12 mol.% of the conventional deposition methods. The sputtering of ScSZ films on hot substrates resulted in a doubling of crystallite size and a decrease in the cubic phase range to 7.4–11 mol% of Sc2O3 content. This confirmed that the size of crystallites is one of the determining factors for expanding the concentration range for forming and stabilizing the cubic phase of ScSZ films. Full article
(This article belongs to the Special Issue Advanced Nanoscale Materials and (Flexible) Devices)
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18 pages, 12129 KB  
Article
Characterization of ZrBSiTaNx Films
by Kuo-Hong Yeh, Li-Chun Chang and Yung-I Chen
Coatings 2024, 14(4), 487; https://doi.org/10.3390/coatings14040487 - 15 Apr 2024
Viewed by 1656
Abstract
In this study, ZrBSiTa and (ZrBSiTa)Nx films were deposited on silicon wafers through direct current magnetron cosputtering. The nitrogen flow ratio (RN2) of the reactive gas and the sputter power applied to the Si target (PSi) were the [...] Read more.
In this study, ZrBSiTa and (ZrBSiTa)Nx films were deposited on silicon wafers through direct current magnetron cosputtering. The nitrogen flow ratio (RN2) of the reactive gas and the sputter power applied to the Si target (PSi) were the variables in the fabricating processes. The influence of the N and Si contents on the mechanical properties, thermal stability, and oxidation behavior of the ZrBSiTa and (ZrBSiTa)Nx films were investigated. All the as-fabricated films exhibited amorphous structures. The RN2 set at 0.1, 0.2, and 0.4 caused the ZrBSiTaNx films to exhibit high N contents of 52–55, 62–64, and 63–64 at.%, respectively. The Si content of the ZrBSiTa films increased from 0 to 42 at.% as PSi increased from 0 to 150 W, and this was accompanied by decreases in hardness and Young’s modulus values from 19.1 to 14.3 GPa and 264 to 242 GPa, respectively. In contrast, the increase in Si content of the (ZrBSiTa)Nx films from 0 to 21 at.% increased the hardness from 11.5 to 14.0 GPa, and Young’s modulus from 207 to 218 GPa. Amorphous BN and SiNx phases in the (ZrBSiTa)Nx films varied the structural and mechanical properties. The thermal stability of the (ZrBSiTa)Nx films was evaluated by annealing at 800–900 °C for 10–30 min in Ar. The oxidation behavior of the (ZrBSiTa)Nx films was evaluated in the ambient air at 800 °C for 0.5–24 h. The amorphous (ZrBSiTa)Nx films with a high Si content had high thermal stability and oxidation resistance. Full article
(This article belongs to the Special Issue Multilayer and Functional Graded Coatings—2nd Edition)
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