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Keywords = Atomic Force Microscopy-based nanolithography

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19 pages, 6713 KB  
Article
Sustainable AFM-Based Nanolithography on Chitosan Thin Films for 2.5D and 3D Nanostructure Fabrication
by Lorenzo Vincenti, Isabella Farella, Mariafrancesca Cascione, Valeria De Matteis, Adriana Campa, Annalisa Bianco, Maurizio Martino, Fabio Quaranta, Alessandro Paolo Bramanti, Rosaria Rinaldi and Paolo Pellegrino
Nanomaterials 2026, 16(12), 724; https://doi.org/10.3390/nano16120724 (registering DOI) - 11 Jun 2026
Viewed by 162
Abstract
The growing request for more sustainable materials and environmentally friendly nanofabrication methods in the electronics field has recently driven the scientific community in the development of bio-derived materials as an alternative to conventional lithographic resists. In this work, we used chitosan, a biodegradable [...] Read more.
The growing request for more sustainable materials and environmentally friendly nanofabrication methods in the electronics field has recently driven the scientific community in the development of bio-derived materials as an alternative to conventional lithographic resists. In this work, we used chitosan, a biodegradable and biocompatible polysaccharide, as a green direct-write resist material for Atomic Force Microscopy-based nanolithography. Chitosan thin layers were obtained by spin coating and systematically characterized, in terms of thickness and surface roughness, demonstrating nanoscale smoothness and tunable film thickness. Three Pulse–Atomic Force Lithography (P-AFL) approaches, i.e., Constant Pulse, Gradient Pulse, and Raster Pulse AFL methods, were used to pattern nanostructures with constant-depth nanogrooves, variable-depth (2.5D) profile, and three-dimensional nanoholes on chitosan films. The results reveal high pattern fidelity, reproducibility, and tunability of feature dimensions as a function of applied force and scanning direction. Moreover, the RP-AFL technique enabled the fabrication of well-defined 3D nanostructures with depths matching the film thickness, which is a prerequisite for subsequent pattern transfer. This experimental work provided a first proof-of-concept to adopt chitosan as a more sustainable alternative with respect to conventional resists. Moreover, the results highlight P-AFL methods as a versatile and low-impact nanofabrication strategy, contributing to the development of greener micro- and nano-manufacturing technologies. Full article
(This article belongs to the Special Issue New Perspective on Micro- and Nano-Lithography Technology)
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12 pages, 3512 KB  
Article
Approaches for Memristive Structures Using Scratching Probe Nanolithography: Towards Neuromorphic Applications
by Roman V. Tominov, Zakhar E. Vakulov, Vadim I. Avilov, Ivan A. Shikhovtsov, Vadim I. Varganov, Victor B. Kazantsev, Lovi Raj Gupta, Chander Prakash and Vladimir A. Smirnov
Nanomaterials 2023, 13(10), 1583; https://doi.org/10.3390/nano13101583 - 9 May 2023
Cited by 4 | Viewed by 2548
Abstract
This paper proposes two different approaches to studying resistive switching of oxide thin films using scratching probe nanolithography of atomic force microscopy (AFM). These approaches allow us to assess the effects of memristor size and top-contact thickness on resistive switching. For that purpose, [...] Read more.
This paper proposes two different approaches to studying resistive switching of oxide thin films using scratching probe nanolithography of atomic force microscopy (AFM). These approaches allow us to assess the effects of memristor size and top-contact thickness on resistive switching. For that purpose, we investigated scratching probe nanolithography regimes using the Taguchi method, which is known as a reliable method for improving the reliability of the result. The AFM parameters, including normal load, scratch distance, probe speed, and probe direction, are optimized on the photoresist thin film by the Taguchi method. As a result, the pinholes with diameter ranged from 25.4 ± 2.2 nm to 85.1 ± 6.3 nm, and the groove array with a depth of 40.5 ± 3.7 nm and a roughness at the bottom of less than a few nanometers was formed. Then, based on the Si/TiN/ZnO/photoresist structures, we fabricated and investigated memristors with different spot sizes and TiN top contact thickness. As a result, the HRS/LRS ratio, USET, and ILRS are well controlled for a memristor size from 27 nm to 83 nm and ranged from ~8 to ~128, from 1.4 ± 0.1 V to 1.8 ± 0.2 V, and from (1.7 ± 0.2) × 10−10 A to (4.2 ± 0.6) × 10−9 A, respectively. Furthermore, the HRS/LRS ratio and USET are well controlled at a TiN top contact thickness from 8.3 ± 1.1 nm to 32.4 ± 4.2 nm and ranged from ~22 to ~188 and from 1.15 ± 0.05 V to 1.62 ± 0.06 V, respectively. The results can be used in the engineering and manufacturing of memristive structures for neuromorphic applications of brain-inspired artificial intelligence systems. Full article
(This article belongs to the Special Issue Advances in Memristive Nanomaterials)
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12 pages, 2152 KB  
Article
Production of Lipid Constructs by Design via Three-Dimensional Nanoprinting
by Yuqi Huang, Arpad Karsai, Pallavi D. Sambre, Wan-Chih Su, Roland Faller, Atul N. Parikh and Gang-yu Liu
Micromachines 2023, 14(2), 372; https://doi.org/10.3390/mi14020372 - 2 Feb 2023
Cited by 4 | Viewed by 3081
Abstract
Atomic force microscopy (AFM) in conjunction with microfluidic delivery was utilized to produce three-dimensional (3D) lipid structures following a custom design. While AFM is well-known for its spatial precision in imaging and 2D nanolithography, the development of AFM-based nanotechnology into 3D nanoprinting requires [...] Read more.
Atomic force microscopy (AFM) in conjunction with microfluidic delivery was utilized to produce three-dimensional (3D) lipid structures following a custom design. While AFM is well-known for its spatial precision in imaging and 2D nanolithography, the development of AFM-based nanotechnology into 3D nanoprinting requires overcoming the technical challenges of controlling material delivery and interlayer registry. This work demonstrates the concept of 3D nanoprinting of amphiphilic molecules such as 1-palmitoyl-2-oleoyl-sn-glycero-3-phosphocholine (POPC). Various formulations of POPC solutions were tested to achieve point, line, and layer-by-layer material delivery. The produced structures include nanometer-thick disks, long linear spherical caps, stacking grids, and organizational chiral architectures. The POPC molecules formed stacking bilayers in these constructions, as revealed by high-resolution structural characterizations. The 3D printing reached nanometer spatial precision over a range of 0.5 mm. The outcomes reveal the promising potential of our designed technology and methodology in the production of 3D structures from nanometer to continuum, opening opportunities in biomaterial sciences and engineering, such as in the production of 3D nanodevices, chiral nanosensors, and scaffolds for tissue engineering and regeneration. Full article
(This article belongs to the Special Issue Women’s Special Issue Series: Micromachines)
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16 pages, 6985 KB  
Article
Investigation of the Effects of Pulse-Atomic Force Nanolithography Parameters on 2.5D Nanostructures’ Morphology
by Paolo Pellegrino, Isabella Farella, Mariafrancesca Cascione, Valeria De Matteis, Alessandro Paolo Bramanti, Antonio Della Torre, Fabio Quaranta and Rosaria Rinaldi
Nanomaterials 2022, 12(24), 4421; https://doi.org/10.3390/nano12244421 - 11 Dec 2022
Cited by 5 | Viewed by 2627
Abstract
In recent years, Atomic Force Microscope (AFM)-based nanolithography techniques have emerged as a very powerful approach for the machining of countless types of nanostructures. However, the conventional AFM-based nanolithography methods suffer from low efficiency, low rate of patterning, and high complexity of execution. [...] Read more.
In recent years, Atomic Force Microscope (AFM)-based nanolithography techniques have emerged as a very powerful approach for the machining of countless types of nanostructures. However, the conventional AFM-based nanolithography methods suffer from low efficiency, low rate of patterning, and high complexity of execution. In this frame, we first developed an easy and effective nanopatterning technique, termed Pulse-Atomic Force Lithography (P-AFL), with which we were able to pattern 2.5D nanogrooves on a thin polymer layer. Indeed, for the first time, we patterned nanogrooves with either constant or varying depth profiles, with sub-nanometre resolution, high accuracy, and reproducibility. In this paper, we present the results on the investigation of the effects of P-AFL parameters on 2.5D nanostructures’ morphology. We considered three main P-AFL parameters, i.e., the pulse’s amplitude (setpoint), the pulses’ width, and the distance between the following indentations (step), and we patterned arrays of grooves after a precise and well-established variation of the aforementioned parameters. Optimizing the nanolithography process, in terms of patterning time and nanostructures quality, we realized unconventional shape nanostructures with high accuracy and fidelity. Finally, a scanning electron microscope was used to confirm that P-AFL does not induce any damage on AFM tips used to pattern the nanostructures. Full article
(This article belongs to the Special Issue Micro/Nano-Machining: Fundamentals and Recent Advances Volume II)
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16 pages, 10250 KB  
Article
Pulse-Atomic Force Lithography: A Powerful Nanofabrication Technique to Fabricate Constant and Varying-Depth Nanostructures
by Paolo Pellegrino, Alessandro Paolo Bramanti, Isabella Farella, Mariafrancesca Cascione, Valeria De Matteis, Antonio Della Torre, Fabio Quaranta and Rosaria Rinaldi
Nanomaterials 2022, 12(6), 991; https://doi.org/10.3390/nano12060991 - 17 Mar 2022
Cited by 15 | Viewed by 4362
Abstract
The widespread use of nanotechnology in different application fields, resulting in the integration of nanostructures in a plethora of devices, has addressed the research toward novel and easy-to-setup nanofabrication techniques to realize nanostructures with high spatial resolution and reproducibility. Owing to countless applications [...] Read more.
The widespread use of nanotechnology in different application fields, resulting in the integration of nanostructures in a plethora of devices, has addressed the research toward novel and easy-to-setup nanofabrication techniques to realize nanostructures with high spatial resolution and reproducibility. Owing to countless applications in molecular electronics, data storage, nanoelectromechanical, and systems for the Internet of Things, in recent decades, the scientific community has focused on developing methods suitable for nanopattern polymers. To this purpose, Atomic Force Microscopy-based nanolithographic techniques are effective methods that are relatively less complex and inexpensive than equally resolute and accurate techniques, such as Electron Beam lithography and Focused Ion Beam lithography. In this work, we propose an evolution of nanoindentation, named Pulse-Atomic Force Microscopy, to obtain continuous structures with a controlled depth profile, either constant or variable, on a polymer layer. Due to the modulation of the characteristics of voltage pulses fed to the AFM piezo-scanner and distance between nanoindentations, it was possible to indent sample surface with high spatial control and fabricate highly resolved 2.5D nanogrooves. That is the real strength of the proposed technique, as no other technique can achieve similar results in tailor-made graded nanogrooves without the need for additional manufacturing steps. Full article
(This article belongs to the Special Issue Micro/Nano-Machining: Fundamentals and Recent Advances)
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18 pages, 4141 KB  
Article
Computational Evolution of Beta-2-Microglobulin Binding Peptides for Nanopatterned Surface Sensors
by Abimbola Feyisara Adedeji Olulana, Miguel A. Soler, Martina Lotteri, Hendrik Vondracek, Loredana Casalis, Daniela Marasco, Matteo Castronovo and Sara Fortuna
Int. J. Mol. Sci. 2021, 22(2), 812; https://doi.org/10.3390/ijms22020812 - 15 Jan 2021
Cited by 9 | Viewed by 4234
Abstract
The bottom-up design of smart nanodevices largely depends on the accuracy by which each of the inherent nanometric components can be functionally designed with predictive methods. Here, we present a rationally designed, self-assembled nanochip capable of capturing a target protein by means of [...] Read more.
The bottom-up design of smart nanodevices largely depends on the accuracy by which each of the inherent nanometric components can be functionally designed with predictive methods. Here, we present a rationally designed, self-assembled nanochip capable of capturing a target protein by means of pre-selected binding sites. The sensing elements comprise computationally evolved peptides, designed to target an arbitrarily selected binding site on the surface of beta-2-Microglobulin (β2m), a globular protein that lacks well-defined pockets. The nanopatterned surface was generated by an atomic force microscopy (AFM)-based, tip force-driven nanolithography technique termed nanografting to construct laterally confined self-assembled nanopatches of single stranded (ss)DNA. These were subsequently associated with an ssDNA–peptide conjugate by means of DNA-directed immobilization, therefore allowing control of the peptide’s spatial orientation. We characterized the sensitivity of such peptide-containing systems against β2m in solution by means of AFM-based differential topographic imaging and surface plasmon resonance (SPR) spectroscopy. Our results show that the confined peptides are capable of specifically capturing β2m from the surface–liquid interface with micromolar affinity, hence providing a viable proof-of-concept for our approach to peptide design. Full article
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16 pages, 8076 KB  
Article
Coupling the Microscopic Healing Behaviour of Coatings to the Thermoreversible Diels-Alder Network Formation
by Joost Brancart, Robrecht Verhelle, Jessica Mangialetto and Guy Van Assche
Coatings 2019, 9(1), 13; https://doi.org/10.3390/coatings9010013 - 26 Dec 2018
Cited by 25 | Viewed by 4695
Abstract
While thermally reversible polymer network coatings based on the Diels-Alder reaction are widely studied, the mechanisms responsible for the heating-mediated healing of damage is still not well understood. The combination of microscopic evaluation techniques and fundamental insights for the thermoreversible network formation in [...] Read more.
While thermally reversible polymer network coatings based on the Diels-Alder reaction are widely studied, the mechanisms responsible for the heating-mediated healing of damage is still not well understood. The combination of microscopic evaluation techniques and fundamental insights for the thermoreversible network formation in the bulk and coating shed light on the mechanisms behind the damage healing events. The thermomechanical properties of thermoset and elastomer coatings, crosslinked by the furan-maleimide Diels-Alder cycloaddition reaction, were studied in bulk and compared to the thermal behaviour applied as coatings onto aluminium substrates. The damage sealing of thermoset (Tg = 79 °C) and elastomer (Tg = −49 °C) coatings were studied using nano-lithography and atomic force microscopy (AFM). The sealing event is studied and modelled at multiple temperatures and correlated to the changes in the network structure and corresponding thermomechanical properties. Full article
(This article belongs to the Special Issue Progress in Self-Healing Coatings)
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10 pages, 8898 KB  
Article
In-Process Atomic-Force Microscopy (AFM) Based Inspection
by Samir Mekid
Sensors 2017, 17(6), 1194; https://doi.org/10.3390/s17061194 - 31 May 2017
Cited by 4 | Viewed by 6561
Abstract
A new in-process atomic-force microscopy (AFM) based inspection is presented for nanolithography to compensate for any deviation such as instantaneous degradation of the lithography probe tip. Traditional method used the AFM probes for lithography work and retract to inspect the obtained feature but [...] Read more.
A new in-process atomic-force microscopy (AFM) based inspection is presented for nanolithography to compensate for any deviation such as instantaneous degradation of the lithography probe tip. Traditional method used the AFM probes for lithography work and retract to inspect the obtained feature but this practice degrades the probe tip shape and hence, affects the measurement quality. This paper suggests a second dedicated lithography probe that is positioned back-to-back to the AFM probe under two synchronized controllers to correct any deviation in the process compared to specifications. This method shows that the quality improvement of the nanomachining, in progress probe tip wear, and better understanding of nanomachining. The system is hosted in a recently developed nanomanipulator for educational and research purposes. Full article
(This article belongs to the Section Physical Sensors)
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17 pages, 4584 KB  
Article
Nanoscale Lithography Mediated by Surface Self-Assembly of 16-[3,5-Bis(Mercaptomethyl)phenoxy]hexadecanoic Acid on Au(111) Investigated by Scanning Probe Microscopy
by Xianglin Zhai, Han Ju Lee, Tian Tian, T. Randall Lee and Jayne C. Garno
Molecules 2014, 19(9), 13010-13026; https://doi.org/10.3390/molecules190913010 - 25 Aug 2014
Cited by 9 | Viewed by 7219
Abstract
The solution-phase self-assembly of bidentate 16-[3,5-bis(mercapto-methyl)phenoxy]hexadecanoic acid (BMPHA) on Au(111) was studied using nano-fabrication protocols with scanning probe nanolithography and immersion particle lithography. Molecularly thin films of BMPHA prepared by surface self-assembly have potential application as spatially selective layers in sensor designs. Either [...] Read more.
The solution-phase self-assembly of bidentate 16-[3,5-bis(mercapto-methyl)phenoxy]hexadecanoic acid (BMPHA) on Au(111) was studied using nano-fabrication protocols with scanning probe nanolithography and immersion particle lithography. Molecularly thin films of BMPHA prepared by surface self-assembly have potential application as spatially selective layers in sensor designs. Either monolayer or bilayer films of BMPHA can be formed under ambient conditions, depending on the parameters of concentration and immersion intervals. Experiments with scanning probe-based lithography (nanoshaving and nanografting) were applied to measure the thickness of BMPHA films. The thickness of a monolayer and bilayer film of BMPHA on Au(111) were measured in situ with atomic force microscopy using n-octadecanethiol as an internal reference. Scanning probe-based nanofabrication provides a way to insert nanopatterns of a reference molecule of known dimensions within a matrix film of unknown thickness to enable a direct comparison of heights and surface morphology. Immersion particle lithography was used to prepare a periodic arrangement of nanoholes within films of BMPHA. The nanoholes could be backfilled by immersion in a SAM solution to produce nanodots of n-octadecanethiol surrounded by a film of BMPHA. Test platforms prepared by immersion particle lithography enables control of the dimensions of surface sites to construct supramolecular assemblies. Full article
(This article belongs to the Special Issue Template Directed Synthesis and Self-Assembly in Organic Systems)
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