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Nanomanufacturing, Volume 6, Issue 1 (March 2026) – 3 articles

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22 pages, 4957 KB  
Article
Machine Learning-Based Algorithm for the Design of Multimode Interference Nanodevices
by Roney das Mercês Cerqueira, Vitaly Félix Rodriguez-Esquerre and Anderson Dourado Sisnando
Nanomanufacturing 2026, 6(1), 3; https://doi.org/10.3390/nanomanufacturing6010003 - 13 Jan 2026
Viewed by 274
Abstract
Multimode interference photonic nanodevices have been increasingly used due to their broad functionality. In this study, we present a methodology based on machine learning algorithms for inverse design capable of providing the output port position (x-axis coordinate) and MMI region length [...] Read more.
Multimode interference photonic nanodevices have been increasingly used due to their broad functionality. In this study, we present a methodology based on machine learning algorithms for inverse design capable of providing the output port position (x-axis coordinate) and MMI region length (y-axis coordinate) for achieving higher optical signal transfer power. This is sufficient to design Multimode Interference 1 × 2, 1 × 3, and 1 × 4 nanodevices as power splitters in the wavelength range between 1350 and 1600 nm, which corresponds to the E, S, C, and L bands of the optical communications window. Using Multilayer Perceptron artificial neural networks, trained with k-fold cross-validation, we successfully modeled the complex relationship between geometric parameters and optical responses with high precision and low computational cost. The results of this project meet the requirements for photonic device projects of this nature, demonstrating excellent performance and manufacturing tolerance, with insertion losses ranging from 0.34 dB to 0.58 dB. Full article
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25 pages, 10702 KB  
Article
Addressing Challenges in Porous Silicon Fabrication for Manufacturing Multi-Layered Optical Filters
by Noha Gaber, Diaa Khalil and Amr Shaarawi
Nanomanufacturing 2026, 6(1), 2; https://doi.org/10.3390/nanomanufacturing6010002 - 5 Jan 2026
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Abstract
The motivation for this work is to study the cause and present mitigation for some challenges faced in preparing porous silicon. This enables benefiting from the appealing benefits of porous silicon that offers a wide range, simple technique for varying the refractive index. [...] Read more.
The motivation for this work is to study the cause and present mitigation for some challenges faced in preparing porous silicon. This enables benefiting from the appealing benefits of porous silicon that offers a wide range, simple technique for varying the refractive index. Such challenges include the refractive index values, sensitivity to oxidation, some fabrication parameters, and other factors. Additionally, highly doped p-type silicon is preferred to form porous silicon, but it causes high losses, which necessitates its detachment. We investigate some possible causes of refractive index change, especially after detaching the fabricated layers from the silicon substrate. Thereby, we could recommend simple but essential precautions during fabrication to avoid such a change. For example, the native oxide formed in the pores has a role in changing the porosity upon following some fabrication sequence. Oppositely, intrinsic stress doesn’t have a significant role. On another aspect, the effect of differing etching/break times on the filter’s responses has been studied, along with other subtle details that may affect the lateral and depth homogeneity, and thereby the process success. Solving such homogeneity issues allowed reaching thick layers not suffering from the gradient index. It is worth highlighting that several approaches have been reported; unlike these, our method doesn’t require sophisticated equipment that might not be available in every lab. To well characterize the thin films, it has been found essential that freestanding monolayers are used for this purpose. From which, the wavelength-dependent refractive index and absorption coefficient have been determined in the near infrared region (1000–2500 nm) for different fabricated conditions. Excellent fitting with the measured interference pattern has been achieved, indicating the accurate parameter extraction, even without any ellipsometry measurements. This also demonstrates the refractive index homogeneity of the fabricated layer, even with a large thickness of over 16 µm. Subsequently, multilayer structures have been fabricated and tested, showing the successful nano-manufacturing methodology. Full article
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62 pages, 5074 KB  
Review
Advancements in Two-Photon Polymerization (2PP) for Micro and Nanoscale Fabrication
by Prithvi Basu
Nanomanufacturing 2026, 6(1), 1; https://doi.org/10.3390/nanomanufacturing6010001 - 23 Dec 2025
Viewed by 966
Abstract
Two-photon polymerization (2PP) is revolutionizing micro- and nanoscale manufacturing by enabling true 3D fabrication with feature sizes far below the diffraction limit—capabilities that traditional lithography cannot match. By using ultrafast femtosecond laser pulses and nonlinear absorption, 2PP initiates polymerization only at the laser’s [...] Read more.
Two-photon polymerization (2PP) is revolutionizing micro- and nanoscale manufacturing by enabling true 3D fabrication with feature sizes far below the diffraction limit—capabilities that traditional lithography cannot match. By using ultrafast femtosecond laser pulses and nonlinear absorption, 2PP initiates polymerization only at the laser’s focal point, offering unmatched spatial precision. This paper highlights key advancements driving the field forward: the development of new materials engineered for 2PP with improved sensitivity, mechanical strength, and the introduction of high-speed, parallelized fabrication strategies that significantly enhance throughput. These innovations are shifting 2PP from a prototyping tool to a viable method for scalable production. Applications now range from custom biomedical scaffolds to complex photonic and metamaterial structures, demonstrating their growing real-world impact. We also address persistent challenges—including slow writing speeds and limited material options—and explore future directions to overcome these barriers. With continued progress in materials and hardware, 2PP is well positioned to become a cornerstone of next-generation additive manufacturing. Full article
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