Liquid-Based Semiconductor Rheostat for DC Arc Fault Suppression †
Abstract
1. Introduction
2. Background
2.1. The DC Arc Extinction Principle and Mayr’s Model
2.2. Liquid Rheostat Operation and Influence
3. Methodology and Test Results
3.1. Validation of Mayr Model and Actuator Design
3.1.1. Preliminary Arc Measurements
3.1.2. Actuation and Time-Dependence Analysis
3.2. System Resistance Measurements
3.2.1. Varying Length Between Electrodes
3.2.2. Varying Immersion Depth
3.2.3. Concentration Measurement Results and Chemical Composition Analysis
4. Model Validation and Extinction Assessment
4.1. Unified Piecewise Resistance Model (RTOTAL)
4.2. Load Line Analysis and Extinction Assessment
5. System Scaling and Parameter Adjustment
6. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
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| Electrolyte | Electrode Pair | Sensitivity (ΔR/ΔL) (Ω/cm) | RMIN (Ω) |
|---|---|---|---|
| NaHCO3 | Cu ↔ B B ↔ B SS ↔ Cu | 2.30 2.29 2.21 | 5.18 2.60 2.77 |
| KOH | ZS ↔ B SS ↔ ZS ZS↔ ZS | 2.06 1.88 1.87 | 5.18 6.49 7.32 |
| NaCl | SS ↔ SS SS ↔ B Cu ↔ Cu | 1.29 1.20 1.17 | 1.44 1.66 1.26 |
| Electrolyte | Electrode Pair | DRF | Stability Rating |
|---|---|---|---|
| NaHCO3 | ZS ↔ Cu B ↔ Cu B ↔ ZS | 39.10 38.63 24.25 | Maximum Very High High |
| KOH | B ↔ B Cu ↔ Cu B ↔ Cu | 37.59 25.79 13.46 | Most Stable Very High High |
| NaCl | Al ↔ Cu Cu ↔ ZS Al ↔ SS | 23.15 21.60 15.24 | High High High |
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© 2026 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license.
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Ndlhovu, K.; Mathabatha, T.; Braid, J. Liquid-Based Semiconductor Rheostat for DC Arc Fault Suppression. Eng. Proc. 2026, 140, 26. https://doi.org/10.3390/engproc2026140026
Ndlhovu K, Mathabatha T, Braid J. Liquid-Based Semiconductor Rheostat for DC Arc Fault Suppression. Engineering Proceedings. 2026; 140(1):26. https://doi.org/10.3390/engproc2026140026
Chicago/Turabian StyleNdlhovu, Kagiso, Temosho Mathabatha, and James Braid. 2026. "Liquid-Based Semiconductor Rheostat for DC Arc Fault Suppression" Engineering Proceedings 140, no. 1: 26. https://doi.org/10.3390/engproc2026140026
APA StyleNdlhovu, K., Mathabatha, T., & Braid, J. (2026). Liquid-Based Semiconductor Rheostat for DC Arc Fault Suppression. Engineering Proceedings, 140(1), 26. https://doi.org/10.3390/engproc2026140026

