Haefner, S.; Rohn, M.; Frank, P.; Paschew, G.; Elstner, M.; Richter, A.
Improved PNIPAAm-Hydrogel Photopatterning by Process Optimisation with Respect to UV Light Sources and Oxygen Content. Gels 2016, 2, 10.
https://doi.org/10.3390/gels2010010
AMA Style
Haefner S, Rohn M, Frank P, Paschew G, Elstner M, Richter A.
Improved PNIPAAm-Hydrogel Photopatterning by Process Optimisation with Respect to UV Light Sources and Oxygen Content. Gels. 2016; 2(1):10.
https://doi.org/10.3390/gels2010010
Chicago/Turabian Style
Haefner, Sebastian, Mathias Rohn, Philipp Frank, Georgi Paschew, Martin Elstner, and Andreas Richter.
2016. "Improved PNIPAAm-Hydrogel Photopatterning by Process Optimisation with Respect to UV Light Sources and Oxygen Content" Gels 2, no. 1: 10.
https://doi.org/10.3390/gels2010010
APA Style
Haefner, S., Rohn, M., Frank, P., Paschew, G., Elstner, M., & Richter, A.
(2016). Improved PNIPAAm-Hydrogel Photopatterning by Process Optimisation with Respect to UV Light Sources and Oxygen Content. Gels, 2(1), 10.
https://doi.org/10.3390/gels2010010