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Volume 9
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10.3390/photonics9100714
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Article

Equivalent Measurement and Real-Time Compensation of Error Caused by Intensity Change in Deep Sub-Nanometer Displacement Measuring Interferometry

by
Jianing Wang
1,2,
Yunke Sun
1,2,
Xu Xing
1,2,*,
Pengcheng Hu
1,2,
Di Chang
1,2 and
Jiubin Tan
1,2
1
School of Instrumentation Science and Engineering, Harbin Institute of Technology, Harbin 150080, China
2
Key Laboratory of Ultraprecision Intelligent Instrumentation, Ministry of Industry and Information Technology, Harbin 150080, China
*
Author to whom correspondence should be addressed.
Photonics 2022, 9(10), 714; https://doi.org/10.3390/photonics9100714
Submission received: 6 September 2022 / Revised: 27 September 2022 / Accepted: 28 September 2022 / Published: 30 September 2022
(This article belongs to the Special Issue Micro-Nano Optics and High-End Measurement Instruments)
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Abstract

Heterodyne interferometry is playing an increasingly important role in the field of high-end equipment manufacturing. In photolithography, the precision requirement of displacement metrology is increasing to a deep sub-nanometer scale with the decrease in the critical dimension of chips. The error caused by light intensity changes was investigated, and its principle was found to be related to the time difference in photoelectric conversion. On the basis of the analysis of dynamic characteristics of interference light intensity changes in a heterodyne Michaelson interferometer, the influencing factors, and the features of the measurement error, equivalent measurement and real-time compensation methods were investigated and proposed. Experiments revealed that the error was 220 pm using the method of best-gain detection, while it was 4.8 nm using the method of auto-gain detection over a wide dynamic range when the light intensity was reduced by 30%. However, the proposed compensation method successfully reduced the error to less than 40 pm. Therefore, the real-time compensation method based on equivalent measurement can maintain the signal-to-noise ratio while improving the precision of photoelectric conversion, removing the error caused by intensity changes, and helping heterodyne interferometry achieve deep sub-nanometer precision.
Keywords: heterodyne interferometry; avalanche photodiode; error compensation; displacement measurement heterodyne interferometry; avalanche photodiode; error compensation; displacement measurement

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MDPI and ACS Style

Wang, J.; Sun, Y.; Xing, X.; Hu, P.; Chang, D.; Tan, J. Equivalent Measurement and Real-Time Compensation of Error Caused by Intensity Change in Deep Sub-Nanometer Displacement Measuring Interferometry. Photonics 2022, 9, 714. https://doi.org/10.3390/photonics9100714

AMA Style

Wang J, Sun Y, Xing X, Hu P, Chang D, Tan J. Equivalent Measurement and Real-Time Compensation of Error Caused by Intensity Change in Deep Sub-Nanometer Displacement Measuring Interferometry. Photonics. 2022; 9(10):714. https://doi.org/10.3390/photonics9100714

Chicago/Turabian Style

Wang, Jianing, Yunke Sun, Xu Xing, Pengcheng Hu, Di Chang, and Jiubin Tan. 2022. "Equivalent Measurement and Real-Time Compensation of Error Caused by Intensity Change in Deep Sub-Nanometer Displacement Measuring Interferometry" Photonics 9, no. 10: 714. https://doi.org/10.3390/photonics9100714

APA Style

Wang, J., Sun, Y., Xing, X., Hu, P., Chang, D., & Tan, J. (2022). Equivalent Measurement and Real-Time Compensation of Error Caused by Intensity Change in Deep Sub-Nanometer Displacement Measuring Interferometry. Photonics, 9(10), 714. https://doi.org/10.3390/photonics9100714

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