Chu, P.; Wang, Q.; Yang, F.; Chen, G.; He, W.; Pan, H.; Fan, L.; Yang, X.; Shi, J.; Wan, S.
Selective HCl Separation from HCl/SiF4 Mixtures via Glycerol-Based Absorption and Staged Vacuum Desorption. Separations 2026, 13, 109.
https://doi.org/10.3390/separations13040109
AMA Style
Chu P, Wang Q, Yang F, Chen G, He W, Pan H, Fan L, Yang X, Shi J, Wan S.
Selective HCl Separation from HCl/SiF4 Mixtures via Glycerol-Based Absorption and Staged Vacuum Desorption. Separations. 2026; 13(4):109.
https://doi.org/10.3390/separations13040109
Chicago/Turabian Style
Chu, Panpan, Qihan Wang, Fan Yang, Guangpeng Chen, Wangzhiyuan He, Hao Pan, Liting Fan, Xiaojian Yang, Jinpeng Shi, and Shaolong Wan.
2026. "Selective HCl Separation from HCl/SiF4 Mixtures via Glycerol-Based Absorption and Staged Vacuum Desorption" Separations 13, no. 4: 109.
https://doi.org/10.3390/separations13040109
APA Style
Chu, P., Wang, Q., Yang, F., Chen, G., He, W., Pan, H., Fan, L., Yang, X., Shi, J., & Wan, S.
(2026). Selective HCl Separation from HCl/SiF4 Mixtures via Glycerol-Based Absorption and Staged Vacuum Desorption. Separations, 13(4), 109.
https://doi.org/10.3390/separations13040109