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Volume 14
Issue 10
10.3390/electronics14102022
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Article

Impedance Monitoring of Capacitively Coupled Plasma Based on the Vacuum Variable Capacitor Positions of Impedance Matching Unit

by
Hwang Gyu Kim
,
Jiseok Lee
and
Sang Jeen Hong
*
Department of Semiconductor Engineering, Myongji University, Yongin-si 17058, Republic of Korea
*
Author to whom correspondence should be addressed.
Electronics 2025, 14(10), 2022; https://doi.org/10.3390/electronics14102022 (registering DOI)
Submission received: 2 April 2025 / Revised: 9 May 2025 / Accepted: 14 May 2025 / Published: 15 May 2025
(This article belongs to the Special Issue Real-Time Fault Detection and Diagnosis of Industrial Electronics Equipment)
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Abstract

Plasma impedance monitoring in semiconductor manufacturing processes is performed using external sensors, such as voltage-current (VI) probes or directional couplers. Plasma chamber impedance measurements, conducted in non-50 Ω matched transmission lines, suffer from a lack of clean signals due to phase variations and the nonlinearity of plasma, thus, sensor calibration is required for each installment. In this study, we monitored plasma impedance in situ based on the position of the vacuum variable capacitor within the matching network, without employing an external VI probe. We observed changes in the matching position according to parameter variations and subsequently confirmed that the calculated plasma impedance also varied accordingly. This study demonstrates the feasibility of real-time plasma impedance monitoring under 50 Ω-matched conditions without the use of external sensors, thereby simplifying plasma diagnostics.
Keywords: impedance monitoring; impedance matching unit; vacuum variable capacitor (VVC); optical emission spectroscopy (OES); plasma diagnosis impedance monitoring; impedance matching unit; vacuum variable capacitor (VVC); optical emission spectroscopy (OES); plasma diagnosis
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MDPI and ACS Style

Kim, H.G.; Lee, J.; Hong, S.J. Impedance Monitoring of Capacitively Coupled Plasma Based on the Vacuum Variable Capacitor Positions of Impedance Matching Unit. Electronics 2025, 14, 2022. https://doi.org/10.3390/electronics14102022

AMA Style

Kim HG, Lee J, Hong SJ. Impedance Monitoring of Capacitively Coupled Plasma Based on the Vacuum Variable Capacitor Positions of Impedance Matching Unit. Electronics. 2025; 14(10):2022. https://doi.org/10.3390/electronics14102022

Chicago/Turabian Style

Kim, Hwang Gyu, Jiseok Lee, and Sang Jeen Hong. 2025. "Impedance Monitoring of Capacitively Coupled Plasma Based on the Vacuum Variable Capacitor Positions of Impedance Matching Unit" Electronics 14, no. 10: 2022. https://doi.org/10.3390/electronics14102022

APA Style

Kim, H. G., Lee, J., & Hong, S. J. (2025). Impedance Monitoring of Capacitively Coupled Plasma Based on the Vacuum Variable Capacitor Positions of Impedance Matching Unit. Electronics, 14(10), 2022. https://doi.org/10.3390/electronics14102022

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