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Article

TiN-NbN-TiN and Permalloy Nanostructures for Applications in Transmission Electron Microscopy

by
Michael I. Faley
1,2,*,
Joshua Williams
1,2,3,
Penghan Lu
1,2 and
Rafal E. Dunin-Borkowski
1,2
1
Peter Grünberg Institute 5, Forschungszentrum Jülich, 52425 Jülich, Germany
2
Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons, Forschungszentrum Jülich, 52425 Jülich, Germany
3
Faculty of Engineering, University of Duisburg-Essen, 47057 Duisburg, Germany
*
Author to whom correspondence should be addressed.
Electronics 2023, 12(9), 2144; https://doi.org/10.3390/electronics12092144
Submission received: 31 March 2023 / Revised: 30 April 2023 / Accepted: 6 May 2023 / Published: 8 May 2023
(This article belongs to the Special Issue Nanofabrication of Superconducting Circuits)

Abstract

We fabricated superconducting and ferromagnetic nanostructures, which are intended for applications in transmission electron microscopy (TEM), in a commercial sample holder that can be cooled using liquid helium. Nanoscale superconducting quantum-interference devices (nanoSQUIDs) with sub-100 nm nanobridge Josephson junctions (nJJs) were prepared at a distance of ~300 nm from the edges of a 2 mm × 2 mm × 0.05 mm substrate. Thin-film TiN-NbN-TiN heterostructures were used to optimize the superconducting parameters and enhance the oxidation and corrosion resistance of nJJs and nanoSQUIDs. Non-hysteretic I(V) characteristics of nJJs, as well as peak-to-peak quantum oscillations in the V(B) characteristics of the nanoSQUIDs with an amplitude of up to ~20 µV, were obtained at a temperature ~5 K, which is suitable for operation in TEM. Electron-beam lithography, high-selectivity reactive ion etching with pure SF6 gas, and a naturally created undercut in the Si substrate were used to prepare nanoSQUIDs on a SiN membrane within ~500 nm from the edge of the substrate. Permalloy nanodots with diameters down to ~100 nm were prepared on SiN membranes using three nanofabrication methods. High-resolution TEM revealed that permalloy films on a SiN buffer have a polycrystalline structure with an average grain dimension of approximately 5 nm and a lattice constant of ~0.36 nm. The M(H) dependences of the permalloy films were measured and revealed coercive fields of 2 and 10 G at 300 and 5 K, respectively. These technologies are promising for the fabrication of superconducting electronics based on nJJs and ferromagnetic nanostructures for operation in TEM.
Keywords: titanium nitride; niobium nitride; nanofabrication; heterostructures; nanobridge Josephson junction; nanoSQUID; permalloy; nanodot; SiN membrane; transmission electron microscopy titanium nitride; niobium nitride; nanofabrication; heterostructures; nanobridge Josephson junction; nanoSQUID; permalloy; nanodot; SiN membrane; transmission electron microscopy

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MDPI and ACS Style

Faley, M.I.; Williams, J.; Lu, P.; Dunin-Borkowski, R.E. TiN-NbN-TiN and Permalloy Nanostructures for Applications in Transmission Electron Microscopy. Electronics 2023, 12, 2144. https://doi.org/10.3390/electronics12092144

AMA Style

Faley MI, Williams J, Lu P, Dunin-Borkowski RE. TiN-NbN-TiN and Permalloy Nanostructures for Applications in Transmission Electron Microscopy. Electronics. 2023; 12(9):2144. https://doi.org/10.3390/electronics12092144

Chicago/Turabian Style

Faley, Michael I., Joshua Williams, Penghan Lu, and Rafal E. Dunin-Borkowski. 2023. "TiN-NbN-TiN and Permalloy Nanostructures for Applications in Transmission Electron Microscopy" Electronics 12, no. 9: 2144. https://doi.org/10.3390/electronics12092144

APA Style

Faley, M. I., Williams, J., Lu, P., & Dunin-Borkowski, R. E. (2023). TiN-NbN-TiN and Permalloy Nanostructures for Applications in Transmission Electron Microscopy. Electronics, 12(9), 2144. https://doi.org/10.3390/electronics12092144

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