Simionescu, O.-G.; Romanițan, C.; Tutunaru, O.; Ion, V.; Buiu, O.; Avram, A.
RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate. Coatings 2019, 9, 442.
https://doi.org/10.3390/coatings9070442
AMA Style
Simionescu O-G, Romanițan C, Tutunaru O, Ion V, Buiu O, Avram A.
RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate. Coatings. 2019; 9(7):442.
https://doi.org/10.3390/coatings9070442
Chicago/Turabian Style
Simionescu, Octavian-Gabriel, Cosmin Romanițan, Oana Tutunaru, Valentin Ion, Octavian Buiu, and Andrei Avram.
2019. "RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate" Coatings 9, no. 7: 442.
https://doi.org/10.3390/coatings9070442
APA Style
Simionescu, O.-G., Romanițan, C., Tutunaru, O., Ion, V., Buiu, O., & Avram, A.
(2019). RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate. Coatings, 9(7), 442.
https://doi.org/10.3390/coatings9070442