Koshtyal, Y.; Nazarov, D.; Ezhov, I.; Mitrofanov, I.; Kim, A.; Rymyantsev, A.; Lyutakov, O.; Popovich, A.; Maximov, M.
Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries. Coatings 2019, 9, 301.
https://doi.org/10.3390/coatings9050301
AMA Style
Koshtyal Y, Nazarov D, Ezhov I, Mitrofanov I, Kim A, Rymyantsev A, Lyutakov O, Popovich A, Maximov M.
Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries. Coatings. 2019; 9(5):301.
https://doi.org/10.3390/coatings9050301
Chicago/Turabian Style
Koshtyal, Yury, Denis Nazarov, Ilya Ezhov, Ilya Mitrofanov, Artem Kim, Aleksander Rymyantsev, Oleksiy Lyutakov, Anatoly Popovich, and Maxim Maximov.
2019. "Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries" Coatings 9, no. 5: 301.
https://doi.org/10.3390/coatings9050301
APA Style
Koshtyal, Y., Nazarov, D., Ezhov, I., Mitrofanov, I., Kim, A., Rymyantsev, A., Lyutakov, O., Popovich, A., & Maximov, M.
(2019). Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries. Coatings, 9(5), 301.
https://doi.org/10.3390/coatings9050301