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Journal: Coatings, 2018
Article: In Situ Plasma Monitoring of PECVD nc-Si:H Films and the Influence of Dilution Ratio on Structural Evolution
Authors: by Yu-Lin Hsieh, Li-Han Kau, Hung-Jui Huang, Chien-Chieh Lee, Yiin-Kuen Fuh and Tomi T. Li
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