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Coatings 2017, 7(9), 136;

Epitaxial Growth of AlN on (0001) Sapphire: Assessment of HVPE Process by a Design of Experiments Approach

Laboratoire de Science et Ingénierie des Matériaux et Procédés (SIMAP), Grenoble INP, Domaine Universitaire, 38042 Saint Martin d’Hères, France
Sino-French Institute of Nuclear Engineering and Technology, Sun Yat-sen University, Zhuhai Campus, Zhuhai 519082, China
Sil’Tronix Silicon Technologies, 382 rue Louis Rustin, 74160 Archamps, France
Author to whom correspondence should be addressed.
Received: 27 July 2017 / Revised: 13 August 2017 / Accepted: 14 August 2017 / Published: 1 September 2017
(This article belongs to the Special Issue Chemical Vapor Deposition)
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This study aims to present the interest of using a design of experiments (DOE) approach for assessing, understanding and improving the hydride vapor phase epitaxy (HVPE) process, a particular class of chemical vapor deposition (CVD) process. The case of the HVPE epitaxial growth of AlN on (0001) sapphire will illustrate this approach. The study proposes the assessment of the influence of 15 process parameters on the quality or desired properties of the grown layers measured by 9 responses. The general method used is a screening design with the Hadamard matrix of order 16. For the first time in the growth of AlN by CVD, a reliable estimation of errors is proposed on the measured responses. This study demonstrates that uncontrolled release of condensed species from the cold wall is the main drawback of this process, explaining many properties of the grown layers that could be mistakenly attributed to other phenomena without the use of a DOE. It appears also that the size of nucleation islands, and its corollary, the stress state of the layer at room temperature, are key points. They are strongly correlated to the crystal quality. Due to the intrinsic limitations of the screening design, the complete optimization of responses cannot be proposed but general guidelines for hydride (or halogen) vapor phase epitaxy (HVPE) experimentations, in particular with cold wall apparatus, are given. View Full-Text
Keywords: AlN; epitaxial growth; DOE approach; HVPE; CVD AlN; epitaxial growth; DOE approach; HVPE; CVD

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Boichot, R.; Chen, D.; Mercier, F.; Baillet, F.; Giusti, G.; Coughlan, T.; Chubarov, M.; Pons, M. Epitaxial Growth of AlN on (0001) Sapphire: Assessment of HVPE Process by a Design of Experiments Approach. Coatings 2017, 7, 136.

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