Article Versions Notes

Zhang R, Peng J, Zhang X, Guo K, Gao Z, Dai W, Wu Z, Xu Y, Wang Q. Preparation and Properties of Plasma Etching-Resistant Y₂O₃ Films. Coatings. 2025; 15(12):1397. https://doi.org/10.3390/coatings15121397

Zhang, Rui, Jiaxing Peng, Xiaobo Zhang, Kesheng Guo, Zecui Gao, Wei Dai, Zhengtao Wu, Yuxiang Xu, and Qimin Wang. 2025. "Preparation and Properties of Plasma Etching-Resistant Y₂O₃ Films" Coatings 15, no. 12: 1397. https://doi.org/10.3390/coatings15121397

Zhang, R., Peng, J., Zhang, X., Guo, K., Gao, Z., Dai, W., Wu, Z., Xu, Y., & Wang, Q. (2025). Preparation and Properties of Plasma Etching-Resistant Y₂O₃ Films. Coatings, 15(12), 1397. https://doi.org/10.3390/coatings15121397